Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing
文献类型：期刊论文
| 作者 | Koseva, R ; Monch, I ; Meier, D ; Schumann, J ; Arndt, KF ; Schultz, L ; Zhao, B ; Schmidt, OG |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 2012 |
| 卷号 | 520期号:17 |
| ISSN号 | 0040-6090 |
| 英文摘要 | Bismuth thin films were grown on oxidized Si substrates by electron beam evaporation. The films showed clear tendency to form hillocks inducing large surface roughness. The evolution of hillocks with film thickness and deposition rate was studied. In order to improve the surface quality of the Bi films a nanoscale mechanical polishing was performed. Upon polishing. hillocks-free Bi thin films were obtained without influencing the crystalline structure and the resistivity of the films. The achieved film surface quality allows to prepare high quality Bi Hall probes with an active area down to the nm(2) range promising for advanced device performance. (C) 2012 Elsevier B.V. All rights reserved. |
| 语种 | 英语 |
| WOS记录号 | WOS:000305770200018 |
| 公开日期 | 2013-12-05 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/13156]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Koseva, R,Monch, I,Meier, D,et al. Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing[J]. THIN SOLID FILMS,2012,520(17). |
| APA | Koseva, R.,Monch, I.,Meier, D.,Schumann, J.,Arndt, KF.,...&Schmidt, OG.(2012).Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing.THIN SOLID FILMS,520(17). |
| MLA | Koseva, R,et al."Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing".THIN SOLID FILMS 520.17(2012). |
入库方式： OAI收割
来源：上海应用物理研究所
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