The plasma nitriding treatment of TiN/TiCN multilayer films
文献类型：期刊论文
| 作者 | Zheng JY(郑建云)1,2 ; Hao JY(郝俊英)1; Liu XQ(刘小强)1,2; Gong QY(龚秋雨)1,2; Liu WM(刘维民)1; Hao JY(郝俊英)
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| 刊名 | Applied Surface Science
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| 出版日期 | 2013 |
| 卷号 | 268页码:195-203 |
| 关键词 | Thick TiN/TiCN multilayer films Plasma-nitriding treatment Structure and properties The diffusion of the amorphous C |
| ISSN号 | 0169-4332 |
| 通讯作者 | 郝俊英 |
| 英文摘要 | The TiN/TiCN multilayer films were deposited by direct current magnetron sputtering, and then the nitriding treatments were carried out in low pressure plasma excited by single-frequency discharge mode. It could be found that the nitriding time had a considerable influence on the composition of uppermost TiCN layer. These variations mainly embodied on the decrement of the Ti C bonds and the increment of the C N and Ti N bonds with increasing the nitriding time. Moreover, after the 40 min plasmanitriding treatment, the TiCN layers within the films produced a mass of amorphous carbon (a-C) due to the decomposition of the supersaturated solid solution, and all TiN layers and the uppermost TiCN layer exhibited fine columnar crystals mixed with some amorphous materials. All the results were attributed to the plasma energy breaking the TiC bonds in the film surface, inducing the structure transformation and supporting the carbon diffusion within the films. In the view of the changes of the structure, the internal stresses and the hardness showed a declining trend slightly. Exhilaratingly, the tribological behaviors of the films were improved significantly by the plasma-nitriding. After 40 min plasma-nitriding, the mean coefficient of friction (COF) and the wear rate of the film sliding 10 h were only about 0.15 and 4.8 × 10−7mm3/N m, respectively. In addition, the COF of TiN layer fell from around 0.4–0.6 in other films to around 0.15 in this film. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the National Nature Science Foundation of China (50905177);the National 973 Project of China (2013CB632300) |
| 语种 | 英语 |
| WOS记录号 | WOS:000315330300030 |
| 公开日期 | 2013-12-18 |
| 源URL | [http://210.77.64.217/handle/362003/4761]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 通讯作者 | Hao JY(郝俊英) |
| 作者单位 | 1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zheng JY,Hao JY,Liu XQ,et al. The plasma nitriding treatment of TiN/TiCN multilayer films[J]. Applied Surface Science,2013,268:195-203. |
| APA | Zheng JY,Hao JY,Liu XQ,Gong QY,Liu WM,&郝俊英.(2013).The plasma nitriding treatment of TiN/TiCN multilayer films.Applied Surface Science,268,195-203. |
| MLA | Zheng JY,et al."The plasma nitriding treatment of TiN/TiCN multilayer films".Applied Surface Science 268(2013):195-203. |
入库方式： OAI收割
来源：兰州化学物理研究所
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