Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers
文献类型:期刊论文
作者 | Zhang HZ ; Cao HT ; Chen AH ; Liang LY ; Liu ZM ; Wan Q |
出版日期 | 2010 |
公开日期 | 2010-06-09 |
源URL | [http://ir.nimte.ac.cn/handle/174433/351] ![]() |
专题 | 宁波材料技术与工程研究所_宁波所知识产出 |
推荐引用方式 GB/T 7714 | Zhang HZ,Cao HT,Chen AH,et al. Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers[J],2010. |
APA | Zhang HZ,Cao HT,Chen AH,Liang LY,Liu ZM,&Wan Q.(2010).Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers.. |
MLA | Zhang HZ,et al."Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers".(2010). |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。