Integrations and challenges of novel high-k gate stacks in advanced CMOS technology
文献类型：期刊论文
| 作者 | He G ; Zhu LQ ; Sun ZQ ; Wan Q ; Zhang LD |
| 出版日期 | 2011 |
| 公开日期 | 2011-07-26 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/2758]  |
| 专题 | 宁波材料技术与工程研究所_宁波所知识产出 |
| 推荐引用方式 GB/T 7714 | He G,Zhu LQ,Sun ZQ,et al. Integrations and challenges of novel high-k gate stacks in advanced CMOS technology[J],2011. |
| APA | He G,Zhu LQ,Sun ZQ,Wan Q,&Zhang LD.(2011).Integrations and challenges of novel high-k gate stacks in advanced CMOS technology.. |
| MLA | He G,et al."Integrations and challenges of novel high-k gate stacks in advanced CMOS technology".(2011). |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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