中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Polarization mechanism and quasi-electric-double-layer modeling for indium-tin-oxide electric-double-layer thin-film-transistors

文献类型:期刊论文

作者Dai MZ(戴明志) ; Mingzhi Daia) and Wangying Xu
刊名APPLIED PHYSICS LETTERS
出版日期2012-03-14
卷号100期号:100页码:113506-1—113506-3
通讯作者戴明志
合作状况李雨桐
中文摘要The polarization mechanism of oxide-based electric-double-layer (EDL) thin-film transistors (TFTs) is not well understood. In this letter, a frequency-dependent circuit model for the oxide-based EDL TFTs is given. In addition, a quasi-EDL model is proposed to explain the conduction mechanism of this kind of EDL TFTs quantitatively. According to this model, in order to ensure an equivalent field-effect mobility up to 1.0 cm2/V s, the minimum ITO channel thickness is 8.5 nm for the self-assembled indium-tin-oxide (ITO)-based EDL TFTs. With the circuit model and the quasi-EDL model, our results may contribute to improved control of oxide-based TFTs.
学科主题物理化学
原文出处SCI收录
公开日期2013-12-16
源URL[http://ir.nimte.ac.cn/handle/174433/9583]  
专题宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式
GB/T 7714
Dai MZ,Mingzhi Daia) and Wangying Xu. Polarization mechanism and quasi-electric-double-layer modeling for indium-tin-oxide electric-double-layer thin-film-transistors[J]. APPLIED PHYSICS LETTERS,2012,100(100):113506-1—113506-3.
APA Dai MZ,&Mingzhi Daia) and Wangying Xu.(2012).Polarization mechanism and quasi-electric-double-layer modeling for indium-tin-oxide electric-double-layer thin-film-transistors.APPLIED PHYSICS LETTERS,100(100),113506-1—113506-3.
MLA Dai MZ,et al."Polarization mechanism and quasi-electric-double-layer modeling for indium-tin-oxide electric-double-layer thin-film-transistors".APPLIED PHYSICS LETTERS 100.100(2012):113506-1—113506-3.

入库方式: OAI收割

来源:宁波材料技术与工程研究所

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