中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of rapid thermal annealing on the process of aluminum induced crystallization of amorphous Si

文献类型:期刊论文

作者Rui-Qin Tan ; Xiao-Li Zhai • Rui-Qin Tan • Shi-Xun Dai • Wei-Yan Wang • Jin-Hua Huang • Wei-Jie Song
刊名Journal of Materials Science: Materials in Electronics
出版日期2013-07-01
卷号62期号:7页码:2379—2384
通讯作者Rui-Qin Tan
合作状况李雨桐
中文摘要The effects of annealing methods on the crystallization process and microstructure of polycrystalline silicon (poly-Si) films obtained by aluminum-induced crystallization (AIC) of amorphous Si (a-Si) films were comparatively investigated. Glass/Al/a-Si structures were annealed by rapid thermal annealing (RTA) and conventional furnace at 500 C for different times in Ar. As compared to furnace annealing, AIC of a-Si films annealed by RTA possesses a shorter period of nucleation time, a higher nucleation density and reduces the process time to form continuous poly-Si films. It is revealed that the continuous Si films obtained by both RTA and conventional furnace annealing are polycrystalline in nature, exhibiting good microstructures with Raman peaks at 518 cm-1 and full-width at half-maximums of 6.43–6.48 cm-1.
学科主题物理化学
原文出处SCI收录
公开日期2013-12-16
源URL[http://ir.nimte.ac.cn/handle/174433/9958]  
专题宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式
GB/T 7714
Rui-Qin Tan,Xiao-Li Zhai • Rui-Qin Tan • Shi-Xun Dai • Wei-Yan Wang • Jin-Hua Huang • Wei-Jie Song. Influence of rapid thermal annealing on the process of aluminum induced crystallization of amorphous Si[J]. Journal of Materials Science: Materials in Electronics,2013,62(7):2379—2384.
APA Rui-Qin Tan,&Xiao-Li Zhai • Rui-Qin Tan • Shi-Xun Dai • Wei-Yan Wang • Jin-Hua Huang • Wei-Jie Song.(2013).Influence of rapid thermal annealing on the process of aluminum induced crystallization of amorphous Si.Journal of Materials Science: Materials in Electronics,62(7),2379—2384.
MLA Rui-Qin Tan,et al."Influence of rapid thermal annealing on the process of aluminum induced crystallization of amorphous Si".Journal of Materials Science: Materials in Electronics 62.7(2013):2379—2384.

入库方式: OAI收割

来源:宁波材料技术与工程研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。