中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER

文献类型:期刊论文

作者C. J. Dong ; M. Xu ; W. Lu ; Q. Z. Huang
刊名Surface Review and Letters
出版日期2013
卷号20期号:2
关键词Thin films nitrides sputtering microstructure chemical-vapor-deposition molecular-beam epitaxy optical-properties lattice-constants phase epitaxy wurtzite inn thin-films layers spectroscopy nitridation
ISSN号0218-625X
原文出处://WOS:000320466300005
语种英语
公开日期2013-12-24
源URL[http://ir.imr.ac.cn/handle/321006/71188]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
C. J. Dong,M. Xu,W. Lu,et al. GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER[J]. Surface Review and Letters,2013,20(2).
APA C. J. Dong,M. Xu,W. Lu,&Q. Z. Huang.(2013).GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER.Surface Review and Letters,20(2).
MLA C. J. Dong,et al."GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER".Surface Review and Letters 20.2(2013).

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。