Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods
文献类型：期刊论文
| 作者 | H. Lei ; M. H. Wang ; Y. Hoshi ; T. Uchida ; S. Kobayashi ; Y. Sawada |
| 刊名 | Applied Surface Science
 |
| 出版日期 | 2013 |
| 卷号 | 285页码:389-394 |
| 关键词 | Damage to organic layer Magnetron sputtering (MS) Low voltage sputtering (LVS) Kinetic-energy-control-deposition (KECD) Facing target sputtering (FTS) PL spectra thin-films tris-(8-hydroxyquinoline) aluminum bombardment |
| ISSN号 | 0169-4332 |
| 原文出处 | |
| 语种 | 英语 |
| 公开日期 | 2013-12-24 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/71301]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | H. Lei,M. H. Wang,Y. Hoshi,et al. Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods[J]. Applied Surface Science,2013,285:389-394. |
| APA | H. Lei,M. H. Wang,Y. Hoshi,T. Uchida,S. Kobayashi,&Y. Sawada.(2013).Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods.Applied Surface Science,285,389-394. |
| MLA | H. Lei,et al."Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods".Applied Surface Science 285(2013):389-394. |
入库方式： OAI收割
来源：金属研究所
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