High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating
文献类型:期刊论文
作者 | T. G. Wang ; Y. M. Liu ; H. Sina ; C. M. Shi ; S. Iyengar ; S. Melin ; K. H. Kim |
刊名 | Surface & Coatings Technology |
出版日期 | 2013 |
卷号 | 228页码:140-147 |
ISSN号 | 0257-8972 |
关键词 | Cr2O3 film Arc ion plating Bias voltage Thermal stability Crack area percentage Grain size fatigue crack initiation chromium-oxide coatings p/m super-alloys thin-films mechanical-properties vapor-deposition wear-resistance crn coatings oxidation microstructure |
原文出处 | |
语种 | 英语 |
公开日期 | 2013-12-24 |
源URL | [http://ir.imr.ac.cn/handle/321006/71556] |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | T. G. Wang,Y. M. Liu,H. Sina,et al. High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating[J]. Surface & Coatings Technology,2013,228:140-147. |
APA | T. G. Wang.,Y. M. Liu.,H. Sina.,C. M. Shi.,S. Iyengar.,...&K. H. Kim.(2013).High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating.Surface & Coatings Technology,228,140-147. |
MLA | T. G. Wang,et al."High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating".Surface & Coatings Technology 228(2013):140-147. |
入库方式: OAI收割
来源:金属研究所
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