中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating

文献类型:期刊论文

作者T. G. Wang ; Y. M. Liu ; H. Sina ; C. M. Shi ; S. Iyengar ; S. Melin ; K. H. Kim
刊名Surface & Coatings Technology
出版日期2013
卷号228页码:140-147
ISSN号0257-8972
关键词Cr2O3 film Arc ion plating Bias voltage Thermal stability Crack area percentage Grain size fatigue crack initiation chromium-oxide coatings p/m super-alloys thin-films mechanical-properties vapor-deposition wear-resistance crn coatings oxidation microstructure
原文出处://WOS:000321797100016
语种英语
公开日期2013-12-24
源URL[http://ir.imr.ac.cn/handle/321006/71556]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
T. G. Wang,Y. M. Liu,H. Sina,et al. High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating[J]. Surface & Coatings Technology,2013,228:140-147.
APA T. G. Wang.,Y. M. Liu.,H. Sina.,C. M. Shi.,S. Iyengar.,...&K. H. Kim.(2013).High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating.Surface & Coatings Technology,228,140-147.
MLA T. G. Wang,et al."High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating".Surface & Coatings Technology 228(2013):140-147.

入库方式: OAI收割

来源:金属研究所

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