中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Hot-Filament-Assisted Growth of Straight SiOx Nanowires for Optoelectronic Application

文献类型:期刊论文

作者Niu, MT(牛牧童); Zhang, JP(张锦平)
刊名JOURNAL OF PHYSICAL CHEMISTRY C
出版日期2013-07-11
卷号117期号:27页码:14354-14361
关键词AMORPHOUS SILICA NANOWIRES LIQUID-SOLID MECHANISM OXIDE NANOWIRES LOW-TEMPERATURE TUNGSTEN-OXIDE PHOTOLUMINESCENCE PROPERTIES MOLTEN GALLIUM LARGE-SCALE NANOTUBES CATALYST
通讯作者Jiang, ZM
英文摘要Uniform and straight amorphous SiOx nanowires with a length of several micrometers and, an average diameter of 100 nm were synthesized by directly heating GeSi alloy film substrate with high melting-point tungsten. Systematically comparative experiments suggest that both the tungsten and GeSi alloy film play an important role in the formation of straight amorphous SiOx nanowire. Through detailed morphological, structural and chemical characterizations using electron microscopy, the contact angle anisotropy mechanism is suggested for the growth of the straight SiOx nanowires.
收录类别SCI
语种英语
WOS记录号WOS:000321883600070
公开日期2014-01-13
源URL[http://ir.sinano.ac.cn/handle/332007/1327]  
专题苏州纳米技术与纳米仿生研究所_测试分析平台
推荐引用方式
GB/T 7714
Niu, MT,Zhang, JP. Hot-Filament-Assisted Growth of Straight SiOx Nanowires for Optoelectronic Application[J]. JOURNAL OF PHYSICAL CHEMISTRY C,2013,117(27):14354-14361.
APA Niu, MT,&Zhang, JP.(2013).Hot-Filament-Assisted Growth of Straight SiOx Nanowires for Optoelectronic Application.JOURNAL OF PHYSICAL CHEMISTRY C,117(27),14354-14361.
MLA Niu, MT,et al."Hot-Filament-Assisted Growth of Straight SiOx Nanowires for Optoelectronic Application".JOURNAL OF PHYSICAL CHEMISTRY C 117.27(2013):14354-14361.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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