中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A new method for inner surface modification by plasma source ion implantation (PSII)

文献类型:期刊论文

作者Liu, B ; Liu, CZ ; Cheng, DJ ; Zhang, GL ; He, R ; Yang, SZ
刊名NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
出版日期2001
卷号184期号:4页码:644
关键词AUXILIARY ELECTRODE CYLINDRICAL BORE ENERGY
ISSN号0168-583X
通讯作者Liu, B: Chinese Acad Sci, Inst Phys, Grp C102, POB 603, Beijing 100080, Peoples R China.
中文摘要A new method for inner surface modification. named grid-enhanced inner surface modification by plasma source ion implantation (PSII), was proposed and demonstrated in this paper. By introducing an RF plasma core, which is produced between a central cathode and a coaxial grid electrode, and sputtering the cathode, uniform ion implantation and film deposition on the inner surface of a tubular sample can be realized based upon the PSII technique. (C) 2001 Elsevier Science B.V. All rights reserved.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/33053]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Liu, B,Liu, CZ,Cheng, DJ,et al. A new method for inner surface modification by plasma source ion implantation (PSII)[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2001,184(4):644.
APA Liu, B,Liu, CZ,Cheng, DJ,Zhang, GL,He, R,&Yang, SZ.(2001).A new method for inner surface modification by plasma source ion implantation (PSII).NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,184(4),644.
MLA Liu, B,et al."A new method for inner surface modification by plasma source ion implantation (PSII)".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 184.4(2001):644.

入库方式: OAI收割

来源:物理研究所

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