A new method for inner surface modification by plasma source ion implantation (PSII)
文献类型:期刊论文
作者 | Liu, B ; Liu, CZ ; Cheng, DJ ; Zhang, GL ; He, R ; Yang, SZ |
刊名 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
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出版日期 | 2001 |
卷号 | 184期号:4页码:644 |
关键词 | AUXILIARY ELECTRODE CYLINDRICAL BORE ENERGY |
ISSN号 | 0168-583X |
通讯作者 | Liu, B: Chinese Acad Sci, Inst Phys, Grp C102, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | A new method for inner surface modification. named grid-enhanced inner surface modification by plasma source ion implantation (PSII), was proposed and demonstrated in this paper. By introducing an RF plasma core, which is produced between a central cathode and a coaxial grid electrode, and sputtering the cathode, uniform ion implantation and film deposition on the inner surface of a tubular sample can be realized based upon the PSII technique. (C) 2001 Elsevier Science B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/33053] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Liu, B,Liu, CZ,Cheng, DJ,et al. A new method for inner surface modification by plasma source ion implantation (PSII)[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2001,184(4):644. |
APA | Liu, B,Liu, CZ,Cheng, DJ,Zhang, GL,He, R,&Yang, SZ.(2001).A new method for inner surface modification by plasma source ion implantation (PSII).NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,184(4),644. |
MLA | Liu, B,et al."A new method for inner surface modification by plasma source ion implantation (PSII)".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 184.4(2001):644. |
入库方式: OAI收割
来源:物理研究所
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