Accurate determination of film thickness by low-angle X-ray reflection
文献类型：期刊论文
| 作者 | Ming, X ; Tao, Y ; Yu, WX ; Ning, Y ; Liu, CX ; Mai, ZH ; Lai, WY ; Kun, T |
| 刊名 | CHINESE PHYSICS
 |
| 出版日期 | 2000 |
| 卷号 | 9期号:11页码:833 |
| 关键词 | THIN-FILMS DIFFRACTION SILICON |
| ISSN号 | 1009-1963 |
| 通讯作者 | Ming, X: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | A modified Bragg law for straightforward determining the film thickness by low-angle X-ray reflection was derived based on the geometrical optical theory. We showed that this modified Bragg law and its inference formulae could be used to accurately determine the thickness of the monolayer or multilayer film. Furthermore, the modified Bragg law for determining the superlattice period presented earlier by others can be derived from the above modified Bragg law. The similar inference formulae were also given. The precision in determining the film thickness and/or superlattice period by the above formulae was discussed. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/33452]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Ming, X,Tao, Y,Yu, WX,et al. Accurate determination of film thickness by low-angle X-ray reflection[J]. CHINESE PHYSICS,2000,9(11):833. |
| APA | Ming, X.,Tao, Y.,Yu, WX.,Ning, Y.,Liu, CX.,...&Kun, T.(2000).Accurate determination of film thickness by low-angle X-ray reflection.CHINESE PHYSICS,9(11),833. |
| MLA | Ming, X,et al."Accurate determination of film thickness by low-angle X-ray reflection".CHINESE PHYSICS 9.11(2000):833. |
入库方式： OAI收割
来源：物理研究所
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