Accurate measurements of crystal structure factors using a FEG electron microscope
文献类型:期刊论文
作者 | Ren, G ; Zuo, JM ; Peng, LM |
刊名 | MICRON
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出版日期 | 1997 |
卷号 | 28期号:6页码:459 |
关键词 | DIFFRACTION REFINEMENT PATTERNS SILICON |
ISSN号 | 0968-4328 |
通讯作者 | Ren, G: Chinese Acad Sci, Beijing Lab Electron Microscopy, POB 2724, Beijing 100080, Peoples R China. |
中文摘要 | An experimental procedure for the accurate measurement of crystal structure factors is described. This procedure is based on the use of a field emission gun electron microscope equipped with a Gatan Imaging Filter (GIF) system. The slow-scan CCD camera of the GIF system is first characterized and a constrained least squares restoration scheme is used for the deconvolution of the experimentally recorded raw elastic CBED patterns. The procedure has been applied for the accurate measurement of the (111) and (222) structure factors of silicon single crystal. A residual chi(2) value of 2.87 is achieved and the determined structure factors agree well with previous measurements using X-ray and electron diffraction techniques. (C) 1997 Elsevier Science Ltd. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/33458] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Ren, G,Zuo, JM,Peng, LM. Accurate measurements of crystal structure factors using a FEG electron microscope[J]. MICRON,1997,28(6):459. |
APA | Ren, G,Zuo, JM,&Peng, LM.(1997).Accurate measurements of crystal structure factors using a FEG electron microscope.MICRON,28(6),459. |
MLA | Ren, G,et al."Accurate measurements of crystal structure factors using a FEG electron microscope".MICRON 28.6(1997):459. |
入库方式: OAI收割
来源:物理研究所
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