Adatom ascending at step edges and faceting on fcc metal (110) surfaces
文献类型:期刊论文
作者 | Zhu, WG ; de Mongeot, FB ; Valbusa, U ; Wang, EG ; Zhang, ZY |
刊名 | PHYSICAL REVIEW LETTERS
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出版日期 | 2004 |
卷号 | 92期号:10 |
关键词 | AB-INITIO DIFFUSION-BARRIERS SELF-DIFFUSION CRYSTAL-GROWTH SURFACES PSEUDOPOTENTIALS ENERGY AL |
ISSN号 | 0031-9007 |
通讯作者 | Zhu, WG: Chinese Acad Sci, Int Ctr Quantum Struct, Beijing 100080, Peoples R China. |
中文摘要 | Using first-principles total-energy calculations, we show that an adatom can easily climb up at monatomic-layer-high steps on several representative fcc metal (110) surfaces via a place exchange mechanism. Inclusion of such novel adatom ascending processes in kinetic Monte Carlo simulations of Al(110) homoepitaxy as a prototypical model system can lead to the existence of an intriguing faceting instability, whose dynamical evolution and kinetic nature are explored in comparison with experimental observations. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/33481] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Zhu, WG,de Mongeot, FB,Valbusa, U,et al. Adatom ascending at step edges and faceting on fcc metal (110) surfaces[J]. PHYSICAL REVIEW LETTERS,2004,92(10). |
APA | Zhu, WG,de Mongeot, FB,Valbusa, U,Wang, EG,&Zhang, ZY.(2004).Adatom ascending at step edges and faceting on fcc metal (110) surfaces.PHYSICAL REVIEW LETTERS,92(10). |
MLA | Zhu, WG,et al."Adatom ascending at step edges and faceting on fcc metal (110) surfaces".PHYSICAL REVIEW LETTERS 92.10(2004). |
入库方式: OAI收割
来源:物理研究所
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