中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Adatom ascending at step edges and faceting on fcc metal (110) surfaces

文献类型:期刊论文

作者Zhu, WG ; de Mongeot, FB ; Valbusa, U ; Wang, EG ; Zhang, ZY
刊名PHYSICAL REVIEW LETTERS
出版日期2004
卷号92期号:10
关键词AB-INITIO DIFFUSION-BARRIERS SELF-DIFFUSION CRYSTAL-GROWTH SURFACES PSEUDOPOTENTIALS ENERGY AL
ISSN号0031-9007
通讯作者Zhu, WG: Chinese Acad Sci, Int Ctr Quantum Struct, Beijing 100080, Peoples R China.
中文摘要Using first-principles total-energy calculations, we show that an adatom can easily climb up at monatomic-layer-high steps on several representative fcc metal (110) surfaces via a place exchange mechanism. Inclusion of such novel adatom ascending processes in kinetic Monte Carlo simulations of Al(110) homoepitaxy as a prototypical model system can lead to the existence of an intriguing faceting instability, whose dynamical evolution and kinetic nature are explored in comparison with experimental observations.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/33481]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhu, WG,de Mongeot, FB,Valbusa, U,et al. Adatom ascending at step edges and faceting on fcc metal (110) surfaces[J]. PHYSICAL REVIEW LETTERS,2004,92(10).
APA Zhu, WG,de Mongeot, FB,Valbusa, U,Wang, EG,&Zhang, ZY.(2004).Adatom ascending at step edges and faceting on fcc metal (110) surfaces.PHYSICAL REVIEW LETTERS,92(10).
MLA Zhu, WG,et al."Adatom ascending at step edges and faceting on fcc metal (110) surfaces".PHYSICAL REVIEW LETTERS 92.10(2004).

入库方式: OAI收割

来源:物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。