Aligned 1D silicon nanostructure arrays by plasma etching
文献类型：期刊论文
| 作者 | Bai, XD ; Xu, Z ; Liu, S ; Wang, EG |
| 刊名 | SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
 |
| 出版日期 | 2005 |
| 卷号 | 6期号:7页码:804 |
| 关键词 | ASSISTED FIELD-EMISSION CARBON NANOTIPS TIP ARRAYS FABRICATION EMITTER PILLARS DEVICE CONES FILM |
| ISSN号 | 1468-6996 |
| 通讯作者 | Wang, EG: Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | High-density aligned arrays made of one-dimensional (1D) silicon nanostructures, including nanocone, nanorod, and nanowire, are fabricated by plasma etching in a hot-filament chemical vapor deposition apparatus using the gas mixture of hydrogen, nitrogen and methane. The silicon nanocones are crystalline structure and have a uniform apex angle of about 22 degrees. The cones can be coated in situ with an about 3 nm thick amorphous carbon film by increasing the methane concentration in source gases. With gradually decreasing the plasma intensity, the morphologies of the silicon nanostructures evolve along the nanocone-nanorod-nanowire route, and the nanowire becomes amorphous structure. The model for fabrication process of silicon nanostructures with different morphologies will also be suggested. (c) 2005 Elsevier Ltd. All rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/33549]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Bai, XD,Xu, Z,Liu, S,et al. Aligned 1D silicon nanostructure arrays by plasma etching[J]. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS,2005,6(7):804. |
| APA | Bai, XD,Xu, Z,Liu, S,&Wang, EG.(2005).Aligned 1D silicon nanostructure arrays by plasma etching.SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS,6(7),804. |
| MLA | Bai, XD,et al."Aligned 1D silicon nanostructure arrays by plasma etching".SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 6.7(2005):804. |
入库方式： OAI收割
来源：物理研究所
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