Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma
文献类型：期刊论文
| 作者 | Feng, WR ; Chen, GL ; Li, L ; Lv, GH ; Zhang, XH ; Niu, EW ; Liu, CZ ; Yang, SZ |
| 刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS
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| 出版日期 | 2007 |
| 卷号 | 40期号:14页码:4228 |
| ISSN号 | 0022-3727 |
| 中文摘要 | (Ti,Ta) N films were prepared by pulsed high energy density plasma (PHEDP) from a coaxial gun in N-2 gas. The coaxial gun is composed of a tantalum inner electrode and a titanium outer one. Material characteristics of the (Ti,Ta) N film were investigated by x-ray photoelectron spectroscopy and x-ray diffraction. The microstructure of the film was observed by a scanning electron microscope. The elemental composition and the interface of the film/substrate were analysed using Auger electron spectrometry. Our results suggest that the binary metal nitride film, (Ti,Ta) N, can be prepared by PHEDP. It also shows that dense nanocrystalline (Ti,Ta) N film can be achieved. |
| 收录类别 | SCI |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/34571]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Feng, WR,Chen, GL,Li, L,et al. Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2007,40(14):4228. |
| APA | Feng, WR.,Chen, GL.,Li, L.,Lv, GH.,Zhang, XH.,...&Yang, SZ.(2007).Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma.JOURNAL OF PHYSICS D-APPLIED PHYSICS,40(14),4228. |
| MLA | Feng, WR,et al."Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma".JOURNAL OF PHYSICS D-APPLIED PHYSICS 40.14(2007):4228. |
入库方式： OAI收割
来源：物理研究所
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