Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
文献类型：期刊论文
| 作者 | Niu, EW ; Li, L ; Lv, H ; Chen, H ; Li, XZ ; Yang, XZ ; Yang, SZ |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2008 |
| 卷号 | 254期号:13页码:3909 |
| ISSN号 | 0169-4332 |
| 中文摘要 | The diamond thin films were deposited on silicon substrates under invariable conditions of process pressure, substrate temperature negative direct-current (dc) bias of substrate and microwave power while the rations of methane (CH4) to hydrogen ( H-2) changing from 3 % to 5 % and 9 % using electron-cyclotron-resonance microwave plasma-assisted chemical vapor deposition technique(ECRCVD). In situ Fourier transform infrared spectroscopy (FTIR) have been used to study the plasma species absorbed on the substrate surfaces as well as the species above the substrates surfaces both before and during the nucleation and film growth. It is demonstrated that these techniques canprovide useful information on the early stages of diamond growth. When correlated. with film properties measured by Raman spectroscopy and scanning electron microscopy, the results from FTIR indicate that the absorption of the graphitic and diamond phases are related to the ratio of CH4 to H-2 and can be identified at the early stages of film growth. |
| 收录类别 | SCI |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/34664]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Niu, EW,Li, L,Lv, H,et al. Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias[J]. APPLIED SURFACE SCIENCE,2008,254(13):3909. |
| APA | Niu, EW.,Li, L.,Lv, H.,Chen, H.,Li, XZ.,...&Yang, SZ.(2008).Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias.APPLIED SURFACE SCIENCE,254(13),3909. |
| MLA | Niu, EW,et al."Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias".APPLIED SURFACE SCIENCE 254.13(2008):3909. |
入库方式： OAI收割
来源：物理研究所
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