中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Computational analysis of the vertical Bridgman growth of Te doped GaSb under microgravity

文献类型:期刊论文

作者Liu, YC ; Chen, WC ; Ge, PW ; Huo, CR
刊名CHINESE PHYSICS LETTERS
出版日期2000
卷号17期号:10页码:775
关键词NATURAL-CONVECTION CRYSTAL-GROWTH OXIDES MELT
ISSN号0256-307X
通讯作者Liu, YC: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要A transient analysis of Te doped GaSb melt growth process is performed using finite element method. The solute concentration at the growth interface increases with time because of k < 1. The growth interface shape becomes it little hat at the beginning of the growth compared with the initial shape. Radial segregation occurs even under the g condition. This segregation increases with the increase of gravity when gravity is small, and reaches a maximum at g = 10(-3) for our system.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/35018]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Liu, YC,Chen, WC,Ge, PW,et al. Computational analysis of the vertical Bridgman growth of Te doped GaSb under microgravity[J]. CHINESE PHYSICS LETTERS,2000,17(10):775.
APA Liu, YC,Chen, WC,Ge, PW,&Huo, CR.(2000).Computational analysis of the vertical Bridgman growth of Te doped GaSb under microgravity.CHINESE PHYSICS LETTERS,17(10),775.
MLA Liu, YC,et al."Computational analysis of the vertical Bridgman growth of Te doped GaSb under microgravity".CHINESE PHYSICS LETTERS 17.10(2000):775.

入库方式: OAI收割

来源:物理研究所

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