Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling
文献类型:期刊论文
作者 | Wei, HX ; Langford, RM ; Han, XF ; Coey, JMD |
刊名 | JOURNAL OF APPLIED PHYSICS
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出版日期 | 2006 |
卷号 | 99期号:8 |
关键词 | FILMS |
ISSN号 | 0021-8979 |
通讯作者 | Wei, HX: Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | A method for the controlled fabrication of a nickel perpendicular nanocontact with diameters less than 5 nm is reported. The method involves milling pores through the 100 nm thick silicon nitride membrane using a focused ion beam, and depositing thin Ni film on the both side of the silicon nitride membrane. The shape of the resulting pore and nanocontact size is determined by the initial hole size and redeposition of the sputtered material onto the sidewalls of the holes. A sub-5 nm Ni nanocontact was prepared and the I-V and R-H characteristics measured. (C) 2006 American Institute of Physics. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/35128] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Wei, HX,Langford, RM,Han, XF,et al. Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling[J]. JOURNAL OF APPLIED PHYSICS,2006,99(8). |
APA | Wei, HX,Langford, RM,Han, XF,&Coey, JMD.(2006).Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling.JOURNAL OF APPLIED PHYSICS,99(8). |
MLA | Wei, HX,et al."Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling".JOURNAL OF APPLIED PHYSICS 99.8(2006). |
入库方式: OAI收割
来源:物理研究所
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