中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling

文献类型:期刊论文

作者Wei, HX ; Langford, RM ; Han, XF ; Coey, JMD
刊名JOURNAL OF APPLIED PHYSICS
出版日期2006
卷号99期号:8
关键词FILMS
ISSN号0021-8979
通讯作者Wei, HX: Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, POB 603, Beijing 100080, Peoples R China.
中文摘要A method for the controlled fabrication of a nickel perpendicular nanocontact with diameters less than 5 nm is reported. The method involves milling pores through the 100 nm thick silicon nitride membrane using a focused ion beam, and depositing thin Ni film on the both side of the silicon nitride membrane. The shape of the resulting pore and nanocontact size is determined by the initial hole size and redeposition of the sputtered material onto the sidewalls of the holes. A sub-5 nm Ni nanocontact was prepared and the I-V and R-H characteristics measured. (C) 2006 American Institute of Physics.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/35128]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Wei, HX,Langford, RM,Han, XF,et al. Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling[J]. JOURNAL OF APPLIED PHYSICS,2006,99(8).
APA Wei, HX,Langford, RM,Han, XF,&Coey, JMD.(2006).Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling.JOURNAL OF APPLIED PHYSICS,99(8).
MLA Wei, HX,et al."Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling".JOURNAL OF APPLIED PHYSICS 99.8(2006).

入库方式: OAI收割

来源:物理研究所

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