Controlled ionization-induced injection by tailoring the gas-density profile in laser wakefield acceleration
文献类型：期刊论文
| 作者 | Zeng, M ; Fz, NAMH ; Nakajima, K ; Chen, LM ; Lu, W ; Mori, WB ; Sheng, ZM ; Zhang, J |
| 刊名 | JOURNAL OF PLASMA PHYSICS
 |
| 出版日期 | 2012 |
| 卷号 | 78页码:363 |
| 关键词 | PLASMA-CHANNEL ELECTRON-BEAMS PHYSICS PULSES |
| ISSN号 | 0022-3778 |
| 通讯作者 | Zeng, M: Shanghai Jiao Tong Univ, Key Lab Laser Plasmas, Minist Educ, Shanghai 200240, Peoples R China. |
| 中文摘要 | Ionization-induced injection into a laser-driven wakefield is studied using 2 1/2D OSIRIS simulations. A laser propagates into a gas mixture of 99.5% helium and 0.5% nitrogen with gas density of each rising linearly from 0 to a peak, after which these remain constant. Simulations show that the process can be controlled by varying the scale length of an up-ramp, the laser intensity, and the maximum plasma density. The injection process is controlled by the bubble radius decreasing as laser propagates up the density gradient and laser self-focusing in the flat-top region. A beam with a central energy of 350 MeV and an energy spread (FWHM) of 1.62% was obtained for an up-ramp length of 135 mu m, a normalized vector potential of 2, and a density of 7 x 10(18) cm(-3) (assuming a 0.8 mu m wavelength laser). |
| 收录类别 | SCI |
| 资助信息 | Chinese Academy of Science Visiting Professorship for Senior International Scientists; Natural Science Foundation of China [10734130, 10935002, 11075105]; National Basic Research Program of China [2009GB105002]; National Science Foundation of China (NSFC) [11175119]; US DOE [DE-FC02-07ER41500, DE-FG02-92ER40727]; US NSF [PHY-0904039, PHY-0936266] |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/35138]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zeng, M,Fz, NAMH,Nakajima, K,et al. Controlled ionization-induced injection by tailoring the gas-density profile in laser wakefield acceleration[J]. JOURNAL OF PLASMA PHYSICS,2012,78:363. |
| APA | Zeng, M.,Fz, NAMH.,Nakajima, K.,Chen, LM.,Lu, W.,...&Zhang, J.(2012).Controlled ionization-induced injection by tailoring the gas-density profile in laser wakefield acceleration.JOURNAL OF PLASMA PHYSICS,78,363. |
| MLA | Zeng, M,et al."Controlled ionization-induced injection by tailoring the gas-density profile in laser wakefield acceleration".JOURNAL OF PLASMA PHYSICS 78(2012):363. |
入库方式： OAI收割
来源：物理研究所
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