CONVERGENT-BEAM ELECTRON-DIFFRACTION AND X-RAY-DIFFRACTION CHARACTERIZATION OF STRAINED-LAYER SUPERLATTICES
文献类型：期刊论文
| 作者 | DUAN, XF ; FUNG, KK |
| 刊名 | ULTRAMICROSCOPY
 |
| 出版日期 | 1991 |
| 卷号 | 36期号:4页码:375 |
| 关键词 | CHEMICAL VAPOR-DEPOSITION EPITAXIAL LAYERS INTERFACES SEMICONDUCTORS MICROSCOPY |
| ISSN号 | 0304-3991 |
| 通讯作者 | DUAN, XF: CHINESE ACAD SCI,BEIJING LAB ELECTRON MICROSCOPY,POB 2724,BEIJING 100080,PEOPLES R CHINA. |
| 中文摘要 | The diffraction amplitude of a reflection of a strained-layer superlattice is given explicitly in terms of the strains and thicknesses of the superlattice bilayer using the kinematical theory of electron diffraction. A tension-compression step model of the superlattice is used. This expression which is equivalent to a similar expression given by Segmuller and Blakeslee for X-ray diffraction (XRD) provides insight into the diffraction of superlattices. Superlattice sidebands or peaks in the rocking curves of convergent-beam electron diffraction (CBED) and double-crystal XRD can be inferred and explained. The good match between calculated profiles and experimental profiles of a GexSi1-x/Si superlattice is given as an illustration. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/35167]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | DUAN, XF,FUNG, KK. CONVERGENT-BEAM ELECTRON-DIFFRACTION AND X-RAY-DIFFRACTION CHARACTERIZATION OF STRAINED-LAYER SUPERLATTICES[J]. ULTRAMICROSCOPY,1991,36(4):375. |
| APA | DUAN, XF,&FUNG, KK.(1991).CONVERGENT-BEAM ELECTRON-DIFFRACTION AND X-RAY-DIFFRACTION CHARACTERIZATION OF STRAINED-LAYER SUPERLATTICES.ULTRAMICROSCOPY,36(4),375. |
| MLA | DUAN, XF,et al."CONVERGENT-BEAM ELECTRON-DIFFRACTION AND X-RAY-DIFFRACTION CHARACTERIZATION OF STRAINED-LAYER SUPERLATTICES".ULTRAMICROSCOPY 36.4(1991):375. |
入库方式： OAI收割
来源：物理研究所
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