Crystalline beta-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition
文献类型：期刊论文
| 作者 | Gu, YS ; Zhang, YP ; Duan, ZJ ; Chang, XR ; Tian, ZZ ; Shi, DX ; Ma, LP ; Zhang, XF ; Yuan, L |
| 刊名 | MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
 |
| 出版日期 | 1999 |
| 卷号 | 271期号:1-2页码:206 |
| 关键词 | CARBON NITRIDE FILMS ION-IMPLANTATION CN(X) FILMS SOLIDS GRAPHITE GROWTH |
| ISSN号 | 0921-5093 |
| 通讯作者 | Gu, YS: Beijing Univ Sci & Technol, Dept Mat Phys, Beijing 100083, Peoples R China. |
| 中文摘要 | Carbon nitride films were grown on poly-crystalline metallic substrates, such as Ta, Mo and Pt, by the microwave plasma chemical vapor deposition (MPCVD) method. The deposited films were examined by scanning electron microscope (SEM), energy dispersive X-ray (EDX) and XRD. SEM observations show that the films deposited on Pt substrates consisted of small crystalline grains, while the morphology of the films on the other substrates were irregular. X-ray diffraction experiments show that metallic carbide or nitride are formed in films deposited on Ta and Mo but not on Pt substrates. However, characteristic peaks of crystalline beta-C3N4 and alpha-C3N4 can be seen in films deposited on all three substrates. EDX analysis show that N/C ratios can be as high as 4/3 for carbon nitride films deposited on Pt under optimized growth conditions. (C) 1999 Elsevier Science S.A. All rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/35416]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Gu, YS,Zhang, YP,Duan, ZJ,et al. Crystalline beta-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING,1999,271(1-2):206. |
| APA | Gu, YS.,Zhang, YP.,Duan, ZJ.,Chang, XR.,Tian, ZZ.,...&Yuan, L.(1999).Crystalline beta-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition.MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING,271(1-2),206. |
| MLA | Gu, YS,et al."Crystalline beta-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition".MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 271.1-2(1999):206. |
入库方式： OAI收割
来源：物理研究所
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