Demonstration of high conversion efficiency to second harmonic in a wide tuning range
文献类型：期刊论文
| 作者 | Xia, JF ; Wei, ZY ; Zhang, J |
| 刊名 | OPTICS AND LASER TECHNOLOGY
 |
| 出版日期 | 2000 |
| 卷号 | 32期号:4页码:241 |
| ISSN号 | 0030-3992 |
| 关键词 | 2ND-HARMONIC GENERATION LASER-PULSES BBO |
| 通讯作者 | Xia, JF: Chinese Acad Sci, Inst Phys, Lab Opt Phys, POB 603-04, Beijing 100080, Peoples R China. |
| 中文摘要 | Auger electron spectroscopy (AES) in conjunction with sputter removal by Ar+ ions of only 120 eV has been used to determine the concentration microprofiles generated in polycrystalline Fe3Si, FeSi and FeSi2 samples by a preceding bombardment with Ar+ ions of 1-5 keV. The conversion of the surface sensitive AES ptp-signals measured in dependence of the profiling ion fluence into concentration-versus-depth profiles was facilitated by the fact that the bombardment-induced stoichiometry changes had no noticeable influence on the relative AES detection factors between Si and Fe. The concentration microprofiles extended up to about 16 nm into the solid, and displayed a rather uniform behaviour with a pronounced minimum of the Si concentration at 1-2 nm. Their characteristic features are related to the mean projected ranges of the keV-projectiles in the different iron silicides, and are assumed to provide direct experimental information on the corresponding deposited energy functions. (C) 2000 Elsevier Science B.V. All rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/35704]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Xia, JF,Wei, ZY,Zhang, J. Demonstration of high conversion efficiency to second harmonic in a wide tuning range[J]. OPTICS AND LASER TECHNOLOGY,2000,32(4):241. |
| APA | Xia, JF,Wei, ZY,&Zhang, J.(2000).Demonstration of high conversion efficiency to second harmonic in a wide tuning range.OPTICS AND LASER TECHNOLOGY,32(4),241. |
| MLA | Xia, JF,et al."Demonstration of high conversion efficiency to second harmonic in a wide tuning range".OPTICS AND LASER TECHNOLOGY 32.4(2000):241. |
入库方式： OAI收割
来源：物理研究所
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