中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Deposition of p-type nc-SiC : H thin films with subtle carbon incorporation for applications in p-i-n solar cells

文献类型:期刊论文

作者Xu, Y ; Diao, HW ; Zhang, SB ; Li, XD ; Zeng, XB ; Wang, WJ ; Liao, XB
刊名ACTA PHYSICA SINICA
出版日期2007
卷号56期号:5页码:2915
ISSN号1000-3290
中文摘要This paper presents a detailed study on the effects of carbon incorporation and substrate temperature on structural, optical, and electrical properties of p-type nanocrystalline amorphous silicon films. A p-nc-SiC: H thin film with optical gap of 1.92 eV and activation energy of 0.06 eV is obtained through optimizing the plasma parameters. By using this p-type window layer, single junction diphasic nc-SiC : H/a-Si : H solar cells have been successfully prepared with a V(oc) of 0.94 eV.
收录类别SCI
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/35764]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Xu, Y,Diao, HW,Zhang, SB,et al. Deposition of p-type nc-SiC : H thin films with subtle carbon incorporation for applications in p-i-n solar cells[J]. ACTA PHYSICA SINICA,2007,56(5):2915.
APA Xu, Y.,Diao, HW.,Zhang, SB.,Li, XD.,Zeng, XB.,...&Liao, XB.(2007).Deposition of p-type nc-SiC : H thin films with subtle carbon incorporation for applications in p-i-n solar cells.ACTA PHYSICA SINICA,56(5),2915.
MLA Xu, Y,et al."Deposition of p-type nc-SiC : H thin films with subtle carbon incorporation for applications in p-i-n solar cells".ACTA PHYSICA SINICA 56.5(2007):2915.

入库方式: OAI收割

来源:物理研究所

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