Deposition of TiN films by novel filter cathodic arc technique
文献类型：期刊论文
| 作者 | Niu, EW ; Fan, SH ; Li, L ; Lu, GH ; Feng, WR ; Zhang, GL ; Yang, SZ |
| 刊名 | CHINESE PHYSICS LETTERS
 |
| 出版日期 | 2006 |
| 卷号 | 23期号:6页码:1533 |
| 关键词 | VACUUM-ARC ION-IMPLANTATION VAPOR-DEPOSITION TITANIUM |
| ISSN号 | 0256-307X |
| 通讯作者 | Niu, EW: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | A straight magnetic filtering arc source is used to deposit thin deposits of titanium nitride. The properties of the films depend strongly on the deposition process. TiN films can be deposited directly onto heated substrates in a nitrogen atmosphere or onto unbiased substrates by considering the Ti+ ion beam in about 300eV N-2(+) nitrogen ion bombardment. In the latter case, the film stoichiometry is varied from an N:Ti ratio of 0.6-1.1 by controlling the arrival rates of Ti and nitrogen ions. Meanwhile, simple models are used to describe the evolution of compressive stress as function of the arrival ratio and the composition of the ion-assisted TiN films. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/35765]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Niu, EW,Fan, SH,Li, L,et al. Deposition of TiN films by novel filter cathodic arc technique[J]. CHINESE PHYSICS LETTERS,2006,23(6):1533. |
| APA | Niu, EW.,Fan, SH.,Li, L.,Lu, GH.,Feng, WR.,...&Yang, SZ.(2006).Deposition of TiN films by novel filter cathodic arc technique.CHINESE PHYSICS LETTERS,23(6),1533. |
| MLA | Niu, EW,et al."Deposition of TiN films by novel filter cathodic arc technique".CHINESE PHYSICS LETTERS 23.6(2006):1533. |
入库方式： OAI收割
来源：物理研究所
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