Diamond nucleation on nonscratched Si substrate pretreated by pulsed high-temperature and high-density CH4-plasma beam
文献类型：期刊论文
| 作者 | Jiang, YB ; Zhang, HX ; Liu, CZ ; Liu, B ; Lin, ZD ; Wu, C ; Yang, SZ |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
 |
| 出版日期 | 1998 |
| 卷号 | 16期号:5页码:3138 |
| 关键词 | BIAS-ENHANCED NUCLEATION CHEMICAL VAPOR-DEPOSITION FILMS SILICON GROWTH |
| ISSN号 | 0734-2101 |
| 通讯作者 | Zhang, HX: Chinese Acad Sci, State Key Lab Surface Phys, Beijing 100080, Peoples R China. |
| 中文摘要 | While great interest has been focused on low-temperature plasma chemical vapor deposition, the pulsed high-temperature and high-density plasma beam was utilized to enhance diamond nucleation on Si substrate without damaging the smoothness of Si surface, and a nucleation density up to 10(9) cm(-2) was obtained. Scanning electron microscopy, atomic force microscopy, x-ray photoelectron spectroscopy, and transmission electron microscopy results indicated that after pretreated by this high power CH4 plasma,an amorphous modified layer rich in sp(3)-hybridized carbon was formed on the Si surface. This layer was believed to provide large amounts of nucleation sites for diamond. (C) 1998 American Vacuum Society. [S0734-2101(98)01905-8]. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/35912]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Jiang, YB,Zhang, HX,Liu, CZ,et al. Diamond nucleation on nonscratched Si substrate pretreated by pulsed high-temperature and high-density CH4-plasma beam[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,1998,16(5):3138. |
| APA | Jiang, YB.,Zhang, HX.,Liu, CZ.,Liu, B.,Lin, ZD.,...&Yang, SZ.(1998).Diamond nucleation on nonscratched Si substrate pretreated by pulsed high-temperature and high-density CH4-plasma beam.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,16(5),3138. |
| MLA | Jiang, YB,et al."Diamond nucleation on nonscratched Si substrate pretreated by pulsed high-temperature and high-density CH4-plasma beam".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 16.5(1998):3138. |
入库方式： OAI收割
来源：物理研究所
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