Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process
文献类型：期刊论文
| 作者 | Yin, LC ; Luan, S ; Lv, GH ; Wang, XQ ; Huang, J ; Jin, H ; Feng, KC ; Yang, SZ |
| 刊名 | CHINESE PHYSICS LETTERS
 |
| 出版日期 | 2008 |
| 卷号 | 25期号:11页码:4072 |
| 关键词 | COATINGS OXIDATION MICROSTRUCTURE HARD |
| ISSN号 | 0256-307X |
| 通讯作者 | Yin, LC: Changchun Univ Sci & Technol, Coll Sci, Changchun 130022, Peoples R China. |
| 中文摘要 | Ti-Si-N thin films with different silicon contents are deposited by a cathodic arc technique in an Ar + N-2 + SiH4 mixture atmosphere. With the increase of silane flow rate, the content of silicon in the Ti-Si-N films varies from 2.0 at.% to 12.2 at.%. Meanwhile, the cross-sectional morphology of these films changes from an apparent columnar microstructure to a dense fine-grained structure. The x-ray diffractometer (XRD) and x-ray photoelectron spectroscopy (XPS) results show that the Ti-Si-N film consists of TiN crystallites and SiNx amorphous phase. The corrosion resistance is improved with the increase of silane flow rate. Growth defects in the films produced play a key role in the corrosion process, especially for the local corrosion. The porosity of the films decreases from 0.13% to 0.00032% by introducing silane at the flow rate of 14 sccm. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/36557]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yin, LC,Luan, S,Lv, GH,et al. Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process[J]. CHINESE PHYSICS LETTERS,2008,25(11):4072. |
| APA | Yin, LC.,Luan, S.,Lv, GH.,Wang, XQ.,Huang, J.,...&Yang, SZ.(2008).Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process.CHINESE PHYSICS LETTERS,25(11),4072. |
| MLA | Yin, LC,et al."Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process".CHINESE PHYSICS LETTERS 25.11(2008):4072. |
入库方式： OAI收割
来源：物理研究所
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