中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Epitaxial growth of Bi2Sr2-xLaxCu1O6+delta thin films by in-situ dc magnetron sputtering

文献类型:期刊论文

作者Zhang, YZ ; Yang, DG ; Li, L ; Zhao, BR ; Jia, SL ; Chen, H ; Wu, F ; Che, GC ; Zhao, ZX
刊名CHINESE PHYSICS LETTERS
出版日期1998
卷号15期号:5页码:373
关键词R = LA SUPERCONDUCTING PROPERTIES SUBSTITUTION OXYGEN ND PR
ISSN号0256-307X
通讯作者Zhang, YZ: Chinese Acad Sci, Inst Phys, Natl Lab Superconduct, POB 603, Beijing 100080, Peoples R China.
中文摘要Bi2Sr2-xLaxCu1O6+delta (La-2201) thin films were successfully prepared on (100) SrTiO3 and (100) LaAlO3 substrates by in-situ dc-magnetron sputtering process. A series compensated 2201 targets of La3+ substitution contents for Sr2+ were studied for growing 2201 phase thin films. The superconducting zero resistance temperature T-c,T-0 reached 19 K. X-ray diffraction analyses showed that films oriented with c-axis perpendicular to the substrate surface and their lattice parameters are around 2.43-2.46 nm. Phi-scan and reciting curve show a good epitaxial growth and crystallisation of the films.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/37495]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhang, YZ,Yang, DG,Li, L,et al. Epitaxial growth of Bi2Sr2-xLaxCu1O6+delta thin films by in-situ dc magnetron sputtering[J]. CHINESE PHYSICS LETTERS,1998,15(5):373.
APA Zhang, YZ.,Yang, DG.,Li, L.,Zhao, BR.,Jia, SL.,...&Zhao, ZX.(1998).Epitaxial growth of Bi2Sr2-xLaxCu1O6+delta thin films by in-situ dc magnetron sputtering.CHINESE PHYSICS LETTERS,15(5),373.
MLA Zhang, YZ,et al."Epitaxial growth of Bi2Sr2-xLaxCu1O6+delta thin films by in-situ dc magnetron sputtering".CHINESE PHYSICS LETTERS 15.5(1998):373.

入库方式: OAI收割

来源:物理研究所

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