中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Epitaxial Tl2Ba2CaCU2OX thin film dc SQUIDs operating at 99 K

文献类型:期刊论文

作者Wang, J ; Han, B ; Xu, FZ ; Chen, GH ; Yang, QS ; Lu, RT ; He, M ; Yan, SL
刊名SUPERCONDUCTOR SCIENCE & TECHNOLOGY
出版日期2004
卷号17期号:10页码:1165
关键词YBA2CU3O7-DELTA GRAIN-BOUNDARIES MICROWAVE SURFACE-RESISTANCE TRANSPORT-PROPERTIES JOSEPHSON JUNCTIONS CRITICAL CURRENTS CU-O SUPERCONDUCTIVITY TEMPERATURE
ISSN号0953-2048
通讯作者Wang, J: Univ Penn, Dept Mech Engn & Appl Mech, 216 Towne Bldg, Philadelphia, PA 19104 USA.
中文摘要Epitaxial Ti2Ba2CaCu2Ox thin film dc superconducting quantum interference devices (dc SQUIDs) have been fabricated on bicrystal SrTiO3 (STO) substrates. By using the Tl-2212 single phase film, a flux noise density, S-Phi(1/2), of 2.0 x 10(-5)Phi(0) Hz(-1/2) at liquid nitrogen temperature was obtained in the white noise region, which is more than one order of magnitude lower than previous Tl-based SQUIDs made by multiphase thin films. The Tl-2212 thin film bicrystal grain boundary Josephson junctions have demonstrated resistively shunted junction (RSJ) behaviour. The characteristic voltage, VC, which is the product of critical current I-C and junction resistance R-N, was 45 muV at 95 K. The dependence of the critical current on temperature near T-C ( 105 K) was measured as I-C(T) similar to (1 - T / T-C)(1.5-1.98). The dc SQUIDs can operate at temperatures up to 99 K.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/37535]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Wang, J,Han, B,Xu, FZ,et al. Epitaxial Tl2Ba2CaCU2OX thin film dc SQUIDs operating at 99 K[J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY,2004,17(10):1165.
APA Wang, J.,Han, B.,Xu, FZ.,Chen, GH.,Yang, QS.,...&Yan, SL.(2004).Epitaxial Tl2Ba2CaCU2OX thin film dc SQUIDs operating at 99 K.SUPERCONDUCTOR SCIENCE & TECHNOLOGY,17(10),1165.
MLA Wang, J,et al."Epitaxial Tl2Ba2CaCU2OX thin film dc SQUIDs operating at 99 K".SUPERCONDUCTOR SCIENCE & TECHNOLOGY 17.10(2004):1165.

入库方式: OAI收割

来源:物理研究所

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