Evidence for electron-electron interaction in topological insulator thin films
文献类型：期刊论文
| 作者 | Wang, J ; DaSilva, AM ; Chang, CZ ; He, K ; Jain, JK ; Samarth, N ; Ma, XC ; Xue, QK ; Chan, MHW |
| 刊名 | PHYSICAL REVIEW B
 |
| 出版日期 | 2011 |
| 卷号 | 83期号:24 |
| 关键词 | BI2SE3 MAGNETORESISTANCE SURFACE NANORIBBONS TRANSPORT N-BI2SE3 SYSTEMS BI2TE3 |
| ISSN号 | 1098-0121 |
| 通讯作者 | Wang, J: Penn State Univ, Ctr Nanoscale Sci, University Pk, PA 16802 USA. |
| 中文摘要 | We consider in our work single crystal thin films of Bi(2)Se(3), grown by molecular beam epitaxy, both with and without Pb doping. Angle-resolved photoemission data demonstrate topological surface states with a Fermi level lying inside the bulk band gap in the Pb-doped films. Transport data show weak localization behavior, as expected for a thin film in the two-dimensional limit (when the thickness is smaller than the inelastic mean free path), but a detailed analysis within the standard theoretical framework of diffusive transport shows that the temperature and magnetic field dependences of resistance cannot be reconciled in a theory that neglects inter-electron interactions. We demonstrate that an excellent account of quantum corrections to conductivity is achieved when both disorder and interaction are taken into account. These results clearly demonstrate that it is crucial to include electron-electron interaction for a comprehensive understanding of diffusive transport in topological insulators. While both the ordinary bulk and the topological surface states presumably participate in transport, our analysis does not allow a clear separation of the two contributions. |
| 收录类别 | SCI |
| 资助信息 | Penn State MRSEC under NSF [DMR-0820404]; DOE [DE-SC0005042] |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/37606]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang, J,DaSilva, AM,Chang, CZ,et al. Evidence for electron-electron interaction in topological insulator thin films[J]. PHYSICAL REVIEW B,2011,83(24). |
| APA | Wang, J.,DaSilva, AM.,Chang, CZ.,He, K.,Jain, JK.,...&Chan, MHW.(2011).Evidence for electron-electron interaction in topological insulator thin films.PHYSICAL REVIEW B,83(24). |
| MLA | Wang, J,et al."Evidence for electron-electron interaction in topological insulator thin films".PHYSICAL REVIEW B 83.24(2011). |
入库方式： OAI收割
来源：物理研究所
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