中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Evolution of mosaic structure in Si0.7Ge0.3 epilayers grown on Si(001) substrates

文献类型:期刊论文

作者Li, JH ; Peng, CS ; Mai, ZH ; Zhou, JM ; Huang, Q ; Dai, DY
刊名JOURNAL OF APPLIED PHYSICS
出版日期1999
卷号86期号:3页码:1292
关键词THREADING DISLOCATION DENSITY STRAIN RELAXATION HETEROEPITAXIAL LAYERS MISFIT DISLOCATIONS SURFACE-MORPHOLOGY SUPERLATTICES DIFFRACTION BUFFERS FILMS
ISSN号0021-8979
通讯作者Li, JH: Univ Houston, Dept Phys, Houston, TX 77204 USA.
中文摘要In this article, we report a study of mosaic structures in partially relaxed Si0.7Ge0.3 epilayers grown on Si(001) substrates by x-ray double- and triple-axis diffractometry. The samples have different layer thicknesses and hence different degrees of strain relaxation. Our results show that, at early stages of strain relaxation, the films contain mosaic regions laterally separated by perfect regions. This is because the mosaic structure caused by a misfit dislocation is effectively localized in a lateral range of the layer thickness. Therefore, far from the dislocations, the film is virtually a perfect crystal. With the increase in the degree of strain relaxation, and consequently in the dislocation density, the mosaic regions of the layer expand while the perfect regions shrink and finally vanish completely. Moreover, our results indicate that the conventional method of estimating dislocation density from the x-ray rocking curve width fails in our case. (C) 1999 American Institute of Physics. [S0021-8979(99)01515-7].
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/37645]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Li, JH,Peng, CS,Mai, ZH,et al. Evolution of mosaic structure in Si0.7Ge0.3 epilayers grown on Si(001) substrates[J]. JOURNAL OF APPLIED PHYSICS,1999,86(3):1292.
APA Li, JH,Peng, CS,Mai, ZH,Zhou, JM,Huang, Q,&Dai, DY.(1999).Evolution of mosaic structure in Si0.7Ge0.3 epilayers grown on Si(001) substrates.JOURNAL OF APPLIED PHYSICS,86(3),1292.
MLA Li, JH,et al."Evolution of mosaic structure in Si0.7Ge0.3 epilayers grown on Si(001) substrates".JOURNAL OF APPLIED PHYSICS 86.3(1999):1292.

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来源:物理研究所

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