Fabrication of nickel nanocontacts using nanostencils and electron beam assisted SiO2 deposition
文献类型：期刊论文
| 作者 | Langford, RM ; Wang, TX |
| 刊名 | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
 |
| 出版日期 | 2006 |
| 卷号 | 6期号:8页码:2468 |
| 关键词 | BALLISTIC MAGNETORESISTANCE POINT-CONTACT NANOCONSTRICTIONS IMPLANTATION |
| ISSN号 | 1533-4880 |
| 通讯作者 | Langford, RM: Univ Manchester, Mat Res Ctr, Manchester M13 9PL, Lancs, England. |
| 中文摘要 | Nickel nanocontacts for studying ballistic magneto resistance have been fabricated by sputtering through FIB prepared nanostencil masks and by using electron beam assisted deposition of SiO2 to reduce the size of FIB milled pores through silicon nitride membranes. These two methods are discussed in terms of the nanocontact sizes, fabrication, and yield. The smallest size of the nanocontacts prepared using the nanostencil method was 40 nm and by the filling method was 1-2 nm. The maximum magnetoresistance measured was 1% and no evidence of a large ballistic magnetoresistance was observed. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/37943]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Langford, RM,Wang, TX. Fabrication of nickel nanocontacts using nanostencils and electron beam assisted SiO2 deposition[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,2006,6(8):2468. |
| APA | Langford, RM,&Wang, TX.(2006).Fabrication of nickel nanocontacts using nanostencils and electron beam assisted SiO2 deposition.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,6(8),2468. |
| MLA | Langford, RM,et al."Fabrication of nickel nanocontacts using nanostencils and electron beam assisted SiO2 deposition".JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 6.8(2006):2468. |
入库方式： OAI收割
来源：物理研究所
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