Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nanoimprint lithography technique
文献类型：期刊论文
| 作者 | Qin, F ; Meng, ZM ; Zhong, XL ; Liu, Y ; Li, ZY |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2012 |
| 卷号 | 20期号:12页码:13091 |
| 关键词 | LOW-POWER NANOCAVITIES MICROCAVITY BAND |
| ISSN号 | 1094-4087 |
| 通讯作者 | Qin, F: Chinese Acad Sci, Inst Phys, Lab Opt Phys, POB 603, Beijing 100190, Peoples R China. |
| 中文摘要 | We present a versatile technique based on nano-imprint lithography to fabricate high-quality semiconductor-polymer compound nonlinear photonic crystal (NPC) slabs. The approach allows one to infiltrate uniformly polystyrene materials that possess large Kerr nonlinearity and ultrafast nonlinear response into the cylindrical air holes with diameter of hundred nanometers that are perforated in silicon membranes. Both the structural characterization via the cross-sectional scanning electron microscopy images and the optical characterization via the transmission spectrum measurement undoubtedly show that the fabricated compound NPC samples have uniform and dense polymer infiltration and are of high quality in optical properties. The compound NPC samples exhibit sharp transmission band edges and nondegraded high quality factor of microcavities compared with those in the bare silicon PC. The versatile method can be expanded to make general semiconductor-polymer hybrid optical nanostructures, and thus it may pave the way for reliable and efficient fabrication of ultrafast and ultralow power all-optical tunable integrated photonic devices and circuits (C) 2012 Optical Society of America |
| 收录类别 | SCI |
| 资助信息 | National Basic Research Foundation of China [2011CB922002, 2007CB613205]; Chinese Academy of Sciences [Y1V2013L11] |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/37950]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Qin, F,Meng, ZM,Zhong, XL,et al. Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nanoimprint lithography technique[J]. OPTICS EXPRESS,2012,20(12):13091. |
| APA | Qin, F,Meng, ZM,Zhong, XL,Liu, Y,&Li, ZY.(2012).Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nanoimprint lithography technique.OPTICS EXPRESS,20(12),13091. |
| MLA | Qin, F,et al."Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nanoimprint lithography technique".OPTICS EXPRESS 20.12(2012):13091. |
入库方式： OAI收割
来源：物理研究所
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