Field electron emission from individual diamond cone formed by plasma etching
文献类型：期刊论文
| 作者 | Wang, Q ; Wang, ZL ; Li, JJ ; Huang, Y ; Li, YL ; Gu, CZ ; Cui, Z |
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 2006 |
| 卷号 | 89期号:6 |
| ISSN号 | 0003-6951 |
| 关键词 | TETRAHEDRAL AMORPHOUS-CARBON ARRAYS DEPOSITION FILAMENT NANOTIPS TIPS |
| 通讯作者 | Gu, CZ: Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100080, Peoples R China. |
| 中文摘要 | Field electron emission properties of individual diamond cone were investigated using a customized double-probe scanning electron microscope system. The diamond cone was formed by maskless ion sputtering process in bias-assisted hot filament chemical vapor deposition system. The as-formed sharp diamond cone coated with high-sp(2)-content amorphous carbon exhibited high emission current of about 80 mu A at an applied voltage of 100 V. The field emission was stable and well in consistent with the conventional Fowler-Nordheim emission mechanism, due to a stabilization process in surface work function. It has demonstrated the possibility of using individual diamond cone as a point electron emission source, because of its high field electron emission ability and stable surface state after the process of work function stabilization. (c) 2006 American Institute of Physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/38144]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang, Q,Wang, ZL,Li, JJ,et al. Field electron emission from individual diamond cone formed by plasma etching[J]. APPLIED PHYSICS LETTERS,2006,89(6). |
| APA | Wang, Q.,Wang, ZL.,Li, JJ.,Huang, Y.,Li, YL.,...&Cui, Z.(2006).Field electron emission from individual diamond cone formed by plasma etching.APPLIED PHYSICS LETTERS,89(6). |
| MLA | Wang, Q,et al."Field electron emission from individual diamond cone formed by plasma etching".APPLIED PHYSICS LETTERS 89.6(2006). |
入库方式： OAI收割
来源：物理研究所
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