Field emission enhancement of carbon nitride films by annealing with different durations
文献类型：期刊论文
| 作者 | Li, JJ ; Gu, CZ ; Xu, P ; Wang, Q ; Zheng, WT |
| 刊名 | MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
 |
| 出版日期 | 2006 |
| 卷号 | 126期号:1页码:74 |
| 关键词 | TETRAHEDRAL AMORPHOUS-CARBON THIN-FILMS RAMAN-SPECTROSCOPY NITROGEN DIAMOND CNX MICROSTRUCTURE TEMPERATURE PARAMETERS SPECTRA |
| ISSN号 | 0921-5107 |
| 通讯作者 | Li, JJ: Chinese Acad Sci, Inst Phys, Lab Microfabricat, Beijing 100080, Peoples R China. |
| 中文摘要 | Magnetron sputtered carbon nitride films (CNx) were annealed at 750 degrees C for periods from 30 to 120 min. Effects of annealing with different durations on the field emission of CNx films were investigated and related to the variations of chemical bonding and surface morphology induced by annealing. The results show that annealing effectively enhances field emission ability of the CNx films and that the threshold field was lowered from 13 to 5 V/mu m. The measurements of Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) indicated that annealing leads to a loss of N content and to formation of more graphite-like sp(2) C clusters in the films, and simultaneously the film surface becomes rougher after annealing, all of which is attributed to the increased film field emission. A large number of sp(2) C clusters with good conductivity enables tunneling in the film, making electron emission easier, and moreover, a rougher surface also improves the field enhancement factor of the films. However, continuing to increase annealing time eventually lowers the field emission of the films. (c) 2005 Elsevier B.V. All rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/38149]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Li, JJ,Gu, CZ,Xu, P,et al. Field emission enhancement of carbon nitride films by annealing with different durations[J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,2006,126(1):74. |
| APA | Li, JJ,Gu, CZ,Xu, P,Wang, Q,&Zheng, WT.(2006).Field emission enhancement of carbon nitride films by annealing with different durations.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,126(1),74. |
| MLA | Li, JJ,et al."Field emission enhancement of carbon nitride films by annealing with different durations".MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 126.1(2006):74. |
入库方式： OAI收割
来源：物理研究所
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