中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
GaAs nanostructuring by self-organized stencil mask ion lithography

文献类型:期刊论文

作者Zhang, ZQ ; Chiappe, D ; Toma, A ; Boragno, C ; Guo, JD ; Wang, EG ; de Mongeot, FB
刊名JOURNAL OF APPLIED PHYSICS
出版日期2011
卷号110期号:11
关键词SURFACE-DIFFUSION MORPHOLOGY EVOLUTION FILMS
ISSN号0021-8979
通讯作者de Mongeot, FB: Univ Genoa, Dipartimento Fis, Via Dodecaneso 33, I-16146 Genoa, Italy.
中文摘要We report on nanoscale patterning of GaAs (100) semiconductor substrates employing an ion projection through a self-organized stencil mask. The nanostructured mask, formed by ion beam sputtering of a polycrystalline Au film, allows driving the GaAs morphology strongly out of equilibrium. In a second stage, after the stencil mask is removed, we quantitatively follow the dynamical evolution of the forced system toward equilibrium by analyzing the evolution of the power spectral density of the height profiles and their slope and curvature distribution. Strong differences are observed by comparing the relaxation dynamics of GaAs surfaces which tend to smoothen with that of glass, a material which instead tends to non-linearly amplify the pattern once driven out of equilibrium by the stencil mask. (C) 2011 American Institute of Physics. [doi:10.1063/1.3665693]
收录类别SCI
资助信息MOST; NSF of China; MIUR [2008J858Y7]; CNISM; MAE; Fondazione CARIGE; ENEA under MSE
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/38526]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhang, ZQ,Chiappe, D,Toma, A,et al. GaAs nanostructuring by self-organized stencil mask ion lithography[J]. JOURNAL OF APPLIED PHYSICS,2011,110(11).
APA Zhang, ZQ.,Chiappe, D.,Toma, A.,Boragno, C.,Guo, JD.,...&de Mongeot, FB.(2011).GaAs nanostructuring by self-organized stencil mask ion lithography.JOURNAL OF APPLIED PHYSICS,110(11).
MLA Zhang, ZQ,et al."GaAs nanostructuring by self-organized stencil mask ion lithography".JOURNAL OF APPLIED PHYSICS 110.11(2011).

入库方式: OAI收割

来源:物理研究所

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