Geometric and electronic structure of Cu on corundum (0001) surfaces
文献类型:期刊论文
作者 | Guo, QL ; Wang, EG |
刊名 | SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
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出版日期 | 2005 |
卷号 | 6期号:7页码:795 |
关键词 | CHROMIUM-OXIDE FILMS RAY PHOTOELECTRON-SPECTROSCOPY ALPHA-AL2O3 0001 SURFACE EPITAXIAL-GROWTH ULTRATHIN FILMS THIN-FILM LEED XPS CR2O3(0001) ADSORPTION |
ISSN号 | 1468-6996 |
通讯作者 | Guo, QL: Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | In recent years, we have been focused the attention on the metal growth on (000 1) surfaces of dimetal trioxide, M2O3 (M = At, Cr, V and Fe), with corundum structure including ordered films and single crystals. The surface geometric and electronic structure of Cu on M2O3(0001) has been studied by use of various ultra high vacuum surface analysis techniques, including X-ray photoelectron spectroscopy, Auger electron spectroscopy, high resolution electron energy loss spectroscopy, low energy electron diffraction and ultraviolet photoelectron spectroscopy. This brief review paper shows the main results and highlights that the surface symmetry and chemical interaction between deposit and substrate play an important role in Cu epitaxial growth on M2O3 (0001). (c) 2005 Elsevier Ltd. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/38690] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Guo, QL,Wang, EG. Geometric and electronic structure of Cu on corundum (0001) surfaces[J]. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS,2005,6(7):795. |
APA | Guo, QL,&Wang, EG.(2005).Geometric and electronic structure of Cu on corundum (0001) surfaces.SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS,6(7),795. |
MLA | Guo, QL,et al."Geometric and electronic structure of Cu on corundum (0001) surfaces".SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 6.7(2005):795. |
入库方式: OAI收割
来源:物理研究所
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