Graphene Edge Lithography
文献类型:期刊论文
作者 | Xie, GB ; Shi, ZW ; Yang, R ; Liu, DH ; Yang, W ; Cheng, M ; Wang, DM ; Shi, DX ; Zhang, GY |
刊名 | NANO LETTERS
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出版日期 | 2012 |
卷号 | 12期号:9页码:4642 |
关键词 | NANORIBBON TRANSISTORS CARBON NANOTUBES GATE DIELECTRICS LAYER GRAPHENE ZIGZAG EDGES |
ISSN号 | 1530-6984 |
通讯作者 | Zhang, GY: Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China. |
中文摘要 | Fabrication of graphene nanostructures is of importance for both investigating their intrinsic physical properties and applying them into various functional devices. In this paper, we report a scalable fabrication approach for graphene nanostructures. Compared with conventional lithographic fabrication techniques, this new approach uses graphene edges as the templates or masks and offers advantage in technological simplicity and capability of creating small features below 10 nm scale. Moreover, mask layers used in the fabrication process could be simultaneously used as the dielectric layers for top-gated devices. The as-fabricated graphene nanoribbons (GNRs) are of high quality with the carrier mobility similar to 400 cm(2)/(V s) for typical 15 nm wide ribbons. Our technique allows easy and reproducible fabrication of various graphene nanostructures, such as ribbons and rings, and can be potentially extended to other materials and systems by use of their edges or facets as templates. |
收录类别 | SCI |
资助信息 | National Science Foundation of China; Chinese Ministry of Science and Technology; Chinese Academy of Sciences (CAS) |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/38817] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Xie, GB,Shi, ZW,Yang, R,et al. Graphene Edge Lithography[J]. NANO LETTERS,2012,12(9):4642. |
APA | Xie, GB.,Shi, ZW.,Yang, R.,Liu, DH.,Yang, W.,...&Zhang, GY.(2012).Graphene Edge Lithography.NANO LETTERS,12(9),4642. |
MLA | Xie, GB,et al."Graphene Edge Lithography".NANO LETTERS 12.9(2012):4642. |
入库方式: OAI收割
来源:物理研究所
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