中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Graphene Edge Lithography

文献类型:期刊论文

作者Xie, GB ; Shi, ZW ; Yang, R ; Liu, DH ; Yang, W ; Cheng, M ; Wang, DM ; Shi, DX ; Zhang, GY
刊名NANO LETTERS
出版日期2012
卷号12期号:9页码:4642
关键词NANORIBBON TRANSISTORS CARBON NANOTUBES GATE DIELECTRICS LAYER GRAPHENE ZIGZAG EDGES
ISSN号1530-6984
通讯作者Zhang, GY: Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China.
中文摘要Fabrication of graphene nanostructures is of importance for both investigating their intrinsic physical properties and applying them into various functional devices. In this paper, we report a scalable fabrication approach for graphene nanostructures. Compared with conventional lithographic fabrication techniques, this new approach uses graphene edges as the templates or masks and offers advantage in technological simplicity and capability of creating small features below 10 nm scale. Moreover, mask layers used in the fabrication process could be simultaneously used as the dielectric layers for top-gated devices. The as-fabricated graphene nanoribbons (GNRs) are of high quality with the carrier mobility similar to 400 cm(2)/(V s) for typical 15 nm wide ribbons. Our technique allows easy and reproducible fabrication of various graphene nanostructures, such as ribbons and rings, and can be potentially extended to other materials and systems by use of their edges or facets as templates.
收录类别SCI
资助信息National Science Foundation of China; Chinese Ministry of Science and Technology; Chinese Academy of Sciences (CAS)
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/38817]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Xie, GB,Shi, ZW,Yang, R,et al. Graphene Edge Lithography[J]. NANO LETTERS,2012,12(9):4642.
APA Xie, GB.,Shi, ZW.,Yang, R.,Liu, DH.,Yang, W.,...&Zhang, GY.(2012).Graphene Edge Lithography.NANO LETTERS,12(9),4642.
MLA Xie, GB,et al."Graphene Edge Lithography".NANO LETTERS 12.9(2012):4642.

入库方式: OAI收割

来源:物理研究所

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