中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Grid-shadow effect in grid-enhanced plasma source ion implantation

文献类型:期刊论文

作者Wang, JL ; Zhang, GL ; Wang, YN ; Liu, YF ; Yang, SZ
刊名SURFACE & COATINGS TECHNOLOGY
出版日期2005
卷号192期号:1页码:101
关键词INNER SURFACE MODIFICATION MONTE-CARLO SIMULATION CYLINDRICAL BORE SHEATH TIN
ISSN号0257-8972
通讯作者Wang, JL: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要A grid-shadow effect is observed in grid-enhanced plasma source ion implantation (GEPSII), in which ions produced within the plasma region are extracted through a grid electrode and are then accelerated to the inner surface of a cylindrical bore for implantation. By simulating the ion transportation behaviors from the grid electrode to the inner surface using a Monte Carlo model, we find that the grid-shadow effect results from grid blocking of the ion emission on the grid electrode and that it varies with the experimental parameters such as the gap distance between the grid electrode and the inner surface, the gas pressure, and the applied negative potential. (C) 2004 Elsevier B.V. All rights reserved.
收录类别SCI
语种英语
公开日期2013-09-17
源URL[http://ir.iphy.ac.cn/handle/311004/38847]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Wang, JL,Zhang, GL,Wang, YN,et al. Grid-shadow effect in grid-enhanced plasma source ion implantation[J]. SURFACE & COATINGS TECHNOLOGY,2005,192(1):101.
APA Wang, JL,Zhang, GL,Wang, YN,Liu, YF,&Yang, SZ.(2005).Grid-shadow effect in grid-enhanced plasma source ion implantation.SURFACE & COATINGS TECHNOLOGY,192(1),101.
MLA Wang, JL,et al."Grid-shadow effect in grid-enhanced plasma source ion implantation".SURFACE & COATINGS TECHNOLOGY 192.1(2005):101.

入库方式: OAI收割

来源:物理研究所

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