Grid-shadow effect in grid-enhanced plasma source ion implantation
文献类型:期刊论文
作者 | Wang, JL ; Zhang, GL ; Wang, YN ; Liu, YF ; Yang, SZ |
刊名 | SURFACE & COATINGS TECHNOLOGY
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出版日期 | 2005 |
卷号 | 192期号:1页码:101 |
关键词 | INNER SURFACE MODIFICATION MONTE-CARLO SIMULATION CYLINDRICAL BORE SHEATH TIN |
ISSN号 | 0257-8972 |
通讯作者 | Wang, JL: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | A grid-shadow effect is observed in grid-enhanced plasma source ion implantation (GEPSII), in which ions produced within the plasma region are extracted through a grid electrode and are then accelerated to the inner surface of a cylindrical bore for implantation. By simulating the ion transportation behaviors from the grid electrode to the inner surface using a Monte Carlo model, we find that the grid-shadow effect results from grid blocking of the ion emission on the grid electrode and that it varies with the experimental parameters such as the gap distance between the grid electrode and the inner surface, the gas pressure, and the applied negative potential. (C) 2004 Elsevier B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-17 |
源URL | [http://ir.iphy.ac.cn/handle/311004/38847] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Wang, JL,Zhang, GL,Wang, YN,et al. Grid-shadow effect in grid-enhanced plasma source ion implantation[J]. SURFACE & COATINGS TECHNOLOGY,2005,192(1):101. |
APA | Wang, JL,Zhang, GL,Wang, YN,Liu, YF,&Yang, SZ.(2005).Grid-shadow effect in grid-enhanced plasma source ion implantation.SURFACE & COATINGS TECHNOLOGY,192(1),101. |
MLA | Wang, JL,et al."Grid-shadow effect in grid-enhanced plasma source ion implantation".SURFACE & COATINGS TECHNOLOGY 192.1(2005):101. |
入库方式: OAI收割
来源:物理研究所
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