Growth and small-polaron conduction of hole-doped LaTiO3+delta/2 and NdTiO3+delta/2 thin films
文献类型：期刊论文
| 作者 | Li, J ; Wang, FB ; Wang, P ; Zhang, MJ ; Tian, HY ; Zheng, DN |
| 刊名 | PHYSICAL REVIEW B
 |
| 出版日期 | 2007 |
| 卷号 | 75期号:19 |
| ISSN号 | 1098-0121 |
| 中文摘要 | ReTiO3+delta/2 (Re=La and Nd) thin films have been deposited on (100)LaAlO3 substrates using the pulsed laser deposition technique. The oxygen content in the formula can be tuned to some extent by carefully adjusting the oxygen pressure during film deposition. When grown at higher oxygen pressures, the films tend to be in their fully oxidized insulating form Re2Ti2O7 (delta=1,Ti4+) with a twinned monoclinic structure of [01 (2) over bar](m) orientations. When grown in a background vacuum around 5x10(-4) Pa, the films are lightly hole doped (delta similar to 0,similar to Ti3+) and retain the near-cubic perovskite structure with the [001](c) axis perpendicular to the film surface, though high-density defects may exist. These two phases coexist in the films grown at intermediate oxygen pressures. For the vacuum-grown near-cubic films, the antiferromagnetic ordering dies in the lanthanum titanate due to oxygen doping but still survives in the neodymium titanate owing to the higher electron correlation strength in the latter. The transport behavior in the similar to Ti3+ Mott insulating films can be described well by the small-polaron hopping or variable range hopping model. In the hole-doped metallic films, a temperature-dependent carrier density and Hall mobility were observed, especially at low temperatures. The temperature dependence of the resistance can be almost perfectly fitted by a small-polaron coherent conduction model [R-s(T)=R-s(0)+C omega(alpha)/sinh(2)(T-omega/T)]. |
| 收录类别 | SCI |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/38916]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Li, J,Wang, FB,Wang, P,et al. Growth and small-polaron conduction of hole-doped LaTiO3+delta/2 and NdTiO3+delta/2 thin films[J]. PHYSICAL REVIEW B,2007,75(19). |
| APA | Li, J,Wang, FB,Wang, P,Zhang, MJ,Tian, HY,&Zheng, DN.(2007).Growth and small-polaron conduction of hole-doped LaTiO3+delta/2 and NdTiO3+delta/2 thin films.PHYSICAL REVIEW B,75(19). |
| MLA | Li, J,et al."Growth and small-polaron conduction of hole-doped LaTiO3+delta/2 and NdTiO3+delta/2 thin films".PHYSICAL REVIEW B 75.19(2007). |
入库方式： OAI收割
来源：物理研究所
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