Influence of grid and target radius and ion-neutral collisions on grid-enhanced plasma source ion implantation process
文献类型：期刊论文
| 作者 | Wang, JL ; Zhang, GL ; Fan, SH ; Yang, WB ; Yang, SZ |
| 刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS
 |
| 出版日期 | 2003 |
| 卷号 | 36期号:10页码:1192 |
| 关键词 | INNER SURFACE MODIFICATION SMALL CYLINDRICAL BORE TIME VOLTAGE PULSES AUXILIARY ELECTRODE SHEATH DYNAMICS FINITE-RISE INTERIOR SURFACE |
| ISSN号 | 0022-3727 |
| 通讯作者 | Wang, JL: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique for inner surface modification of materials with cylindrical geometry. In this paper, a collisional fluid model is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process. Assuming the initial ion density along the radial direction is not uniform but determined by diffusion mechanisms, the effects of grid electrode radius, target radius and ion-neutral collisions on the ion dose and impact energy are investigated by solving fluid equations for ions coupled with Boltzmann assumption for electrons and Poisson's equation. The results show that small gap distance between grid electrode and target is favourable to increase the ion dose and impact energy on the target. In addition, ion-neutral collisions can reduce both the ion dose and impact energy. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-17 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/39823]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang, JL,Zhang, GL,Fan, SH,et al. Influence of grid and target radius and ion-neutral collisions on grid-enhanced plasma source ion implantation process[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2003,36(10):1192. |
| APA | Wang, JL,Zhang, GL,Fan, SH,Yang, WB,&Yang, SZ.(2003).Influence of grid and target radius and ion-neutral collisions on grid-enhanced plasma source ion implantation process.JOURNAL OF PHYSICS D-APPLIED PHYSICS,36(10),1192. |
| MLA | Wang, JL,et al."Influence of grid and target radius and ion-neutral collisions on grid-enhanced plasma source ion implantation process".JOURNAL OF PHYSICS D-APPLIED PHYSICS 36.10(2003):1192. |
入库方式： OAI收割
来源：物理研究所
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