Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers
文献类型：期刊论文
| 作者 | Cui, XZ ; Zhang, TC ; Mei, ZX ; Liu, ZL ; Liu, YP ; Guo, Y ; Su, XY ; Xue, QK ; Du, XL |
| 刊名 | ACTA PHYSICA SINICA
 |
| 出版日期 | 2009 |
| 卷号 | 58期号:1页码:309 |
| 关键词 | PHOTONIC CRYSTAL FABRICATION EMISSION SILICON |
| ISSN号 | 1000-3290 |
| 通讯作者 | Du, XL: Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China. |
| 中文摘要 | A ZnO film with two-dimensional periodic structure was grown on Si substrate by radio-frequency plasma-assisted molecular beam epitaxy. The influence of wet-chemical etching on Si (100) and Si (111) substrates patterned with dot arrays was investigated for achieving a ZnO film with good periodic structure. X-ray diffraction and scanning electron microscopy mesurements demonstrate better crystalline quality and surface morphology of ZnO film grown on Si (111) than that on Si (100). The results suggest that the growth method is feasible for the fabrication of ZnO film with good periodic structure. |
| 收录类别 | SCI |
| 资助信息 | National Science Foundation of China [50532090, 60606023, 10604007]; Ministry of Science and Technology of China [2007CB936203]; Chinese Academy of Sciences |
| 语种 | 中文 |
| 公开日期 | 2013-09-18 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/39928]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Cui, XZ,Zhang, TC,Mei, ZX,et al. Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers[J]. ACTA PHYSICA SINICA,2009,58(1):309. |
| APA | Cui, XZ.,Zhang, TC.,Mei, ZX.,Liu, ZL.,Liu, YP.,...&Du, XL.(2009).Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers.ACTA PHYSICA SINICA,58(1),309. |
| MLA | Cui, XZ,et al."Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers".ACTA PHYSICA SINICA 58.1(2009):309. |
入库方式： OAI收割
来源：物理研究所
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