In-situ monitoring of the growth of oxide thin films in PLID using high-pressure reflection high energy electron diffraction
文献类型：期刊论文
| 作者 | Chen, YF ; Peng, W ; Li, J ; Chen, K ; Zhu, XH ; Wang, P ; Zeng, G ; Zheng, DN ; Li, L |
| 刊名 | ACTA PHYSICA SINICA
 |
| 出版日期 | 2003 |
| 卷号 | 52期号:10页码:2601 |
| 关键词 | PULSED-LASER DEPOSITION MOLECULAR-BEAM EPITAXY HIGH OXYGEN-PRESSURE ABLATION SYSTEM LAYER |
| ISSN号 | 1000-3290 |
| 通讯作者 | Chen, YF: Chinese Acad Sci, Inst Phys, Natl Lab Superconductors, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | Reflection high-energy electron diffraction (RHEED) is very surface sensitive and often used for the analysis and monitoring of thin film growth in ultrahigh vacuum deposition system (for instance, Molecular Beam Epitasis). In order to in-situ monitor the growth of oxide thin films at high oxygen pressure up to 50Pa, a high-pressure RHEED designed and fabricated by our group was used for first time in our pulsed laser deposition system (PID). Using the PLD system the Nb-doped SrTiO3 (STNO) and Y1Ba2Cu3O7 (YBCO) thin films have been epitaxially grown on SrTiO3 (001) substrates. The RHEED patterns of the STNO and YBCO films and the oscillation of the intensity of the pattern have been measured by the high-pressure RHEED during deposition. In addition, the surface morpholoyg of the films and the dynamic analysis of film growth process were discussed. |
| 收录类别 | SCI |
| 语种 | 中文 |
| 公开日期 | 2013-09-18 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/40034]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Chen, YF,Peng, W,Li, J,et al. In-situ monitoring of the growth of oxide thin films in PLID using high-pressure reflection high energy electron diffraction[J]. ACTA PHYSICA SINICA,2003,52(10):2601. |
| APA | Chen, YF.,Peng, W.,Li, J.,Chen, K.,Zhu, XH.,...&Li, L.(2003).In-situ monitoring of the growth of oxide thin films in PLID using high-pressure reflection high energy electron diffraction.ACTA PHYSICA SINICA,52(10),2601. |
| MLA | Chen, YF,et al."In-situ monitoring of the growth of oxide thin films in PLID using high-pressure reflection high energy electron diffraction".ACTA PHYSICA SINICA 52.10(2003):2601. |
入库方式： OAI收割
来源：物理研究所
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