Interface chemical states of NiO/NiFe films and their effects on magnetic properties
文献类型：期刊论文
| 作者 | Yu, GH ; Chai, CL ; Zhu, FW ; Lai, WY |
| 刊名 | SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES
 |
| 出版日期 | 2002 |
| 卷号 | 45期号:1页码:27 |
| 关键词 | SPIN-VALVE MULTILAYERS EXCHANGE BIAS THIN-FILMS NIO LAYERS MODEL |
| ISSN号 | 1006-9321 |
| 通讯作者 | Yu, GH: Univ Sci & Technol Beijing, Dept Mat Phys, Beijing 100083, Peoples R China. |
| 中文摘要 | Ta/NiOx/Ni81Fe19/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field (H-ex) and the coercivity (H-c) of NiOx/Ni81Fe19 as a function of the ratio of Ar to O-2 during the deposition process were studied. The composition and chemical states at the interface region of NiOx/NiFe were also investigated using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that the ratio of Ar to O-2 has great effect on the nickel chemical states in NiOx film. When the ratio of Ar to O-2 is equal to 7 and the argon sputtering pressure is 0.57 Pa, the x value is approximately 1 and the valence of nickel is +2. At this point, NiOx is antiferromagnetic NiO and the corresponding H-ex is the largest. As the ratio of Ar/O-2 deviates from 7, the exchange coupling field (H-ex) will decrease due to the presence of magnetic impurities such as Ni+3 or metallic Ni at the interface region of NiOx/NiFe, while the coercivity (H-c) will increase due to the metallic Ni. XPS studies also show that there are two thermodynamically favorable reactions at the NiO/NiFe interface: NiO + Fe = Ni + FeO and 3NiO + 2Fe = 3Ni + Fe2O3. These interface reaction products are magnetic impurities at the interface region of NiO/NiFe. It is believed that these magnetic impurities would have effect on the exchange coupling field (H-ex) and the coercivity (H-c) of NiO/NiFe. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-18 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/40105]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, GH,Chai, CL,Zhu, FW,et al. Interface chemical states of NiO/NiFe films and their effects on magnetic properties[J]. SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES,2002,45(1):27. |
| APA | Yu, GH,Chai, CL,Zhu, FW,&Lai, WY.(2002).Interface chemical states of NiO/NiFe films and their effects on magnetic properties.SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES,45(1),27. |
| MLA | Yu, GH,et al."Interface chemical states of NiO/NiFe films and their effects on magnetic properties".SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES 45.1(2002):27. |
入库方式： OAI收割
来源：物理研究所
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