Low resistivity C54 phase TiSi2 films synthesized by a novel two-step method
文献类型：期刊论文
| 作者 | Li, DF ; Gu, CZ ; Guo, CX ; Yue, SL ; Hu, CW |
| 刊名 | CHINESE PHYSICS LETTERS
 |
| 出版日期 | 2003 |
| 卷号 | 20期号:8页码:1329 |
| 关键词 | CHEMICAL-VAPOR-DEPOSITION TITANIUM SILICIDE THIN-FILMS TEMPERATURE GROWTH |
| ISSN号 | 0256-307X |
| 通讯作者 | Gu, CZ: Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | Synthesis and growth properties of the TiSi2 film on a Si (001) substrate are investigated. A novel two-step method is used for deposition of the C54 phase TiSi2 film with low resistivity. The first step is the formation of the C49 phase TiSi2 at a relative low substrate temperature of 400 C, followed by rapid thermal annealing process at 850degrees C in N-2 for the formation of the C54 phase TiSi2 as the second step. Finally, selective wet, etching is employed to remove the un-reaction Ti on the surface and the low resistivity C54 TiSi2 film can be obtained. The films deposited under various parameters are evaluated by scanning electron microscopy, x-ray diffraction and the resistivity measurement. Compared with other sputtering technologies used commonly for TiSi2 synthesis, this two-step method has apparent advantages such as the mild synthesis temperature and the high purity of the final product with low resistivity, uniform large area and improving surface roughness. In addition, the film also shows that the low coefficient of resistivity-temperature appears in the temperature range from 20degrees C to 800degrees C. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-18 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/40997]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Li, DF,Gu, CZ,Guo, CX,et al. Low resistivity C54 phase TiSi2 films synthesized by a novel two-step method[J]. CHINESE PHYSICS LETTERS,2003,20(8):1329. |
| APA | Li, DF,Gu, CZ,Guo, CX,Yue, SL,&Hu, CW.(2003).Low resistivity C54 phase TiSi2 films synthesized by a novel two-step method.CHINESE PHYSICS LETTERS,20(8),1329. |
| MLA | Li, DF,et al."Low resistivity C54 phase TiSi2 films synthesized by a novel two-step method".CHINESE PHYSICS LETTERS 20.8(2003):1329. |
入库方式： OAI收割
来源：物理研究所
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