Low temperature CO induced growth of Pd supported on a monolayer silica film
文献类型:期刊论文
作者 | Lu, JL ; Kaya, S ; Weissenrieder, J ; Gao, HJ ; Shaikhutdinov, S ; Freund, HJ |
刊名 | SURFACE SCIENCE
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出版日期 | 2006 |
卷号 | 600期号:12页码:L153 |
关键词 | THERMAL-STABILITY MODEL CATALYSTS OXIDE-FILMS ADSORPTION PARTICLES SURFACES |
ISSN号 | 0039-6028 |
通讯作者 | Shaikhutdinov, S: Max Planck Soc, Fritz Haber Inst, Dept Phys Chem, Faradayaweg 4-6, Berlin, Germany. |
中文摘要 | Nucleation, growth and sintering of Pd deposited on an ultra-thin silica film were studied by scanning tunneling microscopy and infrared reflection absorption spectroscopy. No preferential nucleation of Pd on the silica surface was observed both at 90 and 300 K deposition. When adsorbed on Pd clusters formed at 90 K, CO causes a strong sintering effect even at this temperature. The results are rationalized on the basis of a high mobility of Pd carbonyl-like species on the silica film. At a given Pd coverage, the extent of CO induced sintering cannot be achieved by annealing in vacuum. In addition, vacuum sintering, which commences above 700 K, goes simultaneously with interdiffusion of Pd and support. (c) 2006 Elsevier B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-18 |
源URL | [http://ir.iphy.ac.cn/handle/311004/41001] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Lu, JL,Kaya, S,Weissenrieder, J,et al. Low temperature CO induced growth of Pd supported on a monolayer silica film[J]. SURFACE SCIENCE,2006,600(12):L153. |
APA | Lu, JL,Kaya, S,Weissenrieder, J,Gao, HJ,Shaikhutdinov, S,&Freund, HJ.(2006).Low temperature CO induced growth of Pd supported on a monolayer silica film.SURFACE SCIENCE,600(12),L153. |
MLA | Lu, JL,et al."Low temperature CO induced growth of Pd supported on a monolayer silica film".SURFACE SCIENCE 600.12(2006):L153. |
入库方式: OAI收割
来源:物理研究所
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