中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Low temperature CO induced growth of Pd supported on a monolayer silica film

文献类型:期刊论文

作者Lu, JL ; Kaya, S ; Weissenrieder, J ; Gao, HJ ; Shaikhutdinov, S ; Freund, HJ
刊名SURFACE SCIENCE
出版日期2006
卷号600期号:12页码:L153
关键词THERMAL-STABILITY MODEL CATALYSTS OXIDE-FILMS ADSORPTION PARTICLES SURFACES
ISSN号0039-6028
通讯作者Shaikhutdinov, S: Max Planck Soc, Fritz Haber Inst, Dept Phys Chem, Faradayaweg 4-6, Berlin, Germany.
中文摘要Nucleation, growth and sintering of Pd deposited on an ultra-thin silica film were studied by scanning tunneling microscopy and infrared reflection absorption spectroscopy. No preferential nucleation of Pd on the silica surface was observed both at 90 and 300 K deposition. When adsorbed on Pd clusters formed at 90 K, CO causes a strong sintering effect even at this temperature. The results are rationalized on the basis of a high mobility of Pd carbonyl-like species on the silica film. At a given Pd coverage, the extent of CO induced sintering cannot be achieved by annealing in vacuum. In addition, vacuum sintering, which commences above 700 K, goes simultaneously with interdiffusion of Pd and support. (c) 2006 Elsevier B.V. All rights reserved.
收录类别SCI
语种英语
公开日期2013-09-18
源URL[http://ir.iphy.ac.cn/handle/311004/41001]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
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GB/T 7714
Lu, JL,Kaya, S,Weissenrieder, J,et al. Low temperature CO induced growth of Pd supported on a monolayer silica film[J]. SURFACE SCIENCE,2006,600(12):L153.
APA Lu, JL,Kaya, S,Weissenrieder, J,Gao, HJ,Shaikhutdinov, S,&Freund, HJ.(2006).Low temperature CO induced growth of Pd supported on a monolayer silica film.SURFACE SCIENCE,600(12),L153.
MLA Lu, JL,et al."Low temperature CO induced growth of Pd supported on a monolayer silica film".SURFACE SCIENCE 600.12(2006):L153.

入库方式: OAI收割

来源:物理研究所

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