Magnetic properties and x-ray photoelectron spectroscopy study of NiO/NiFe films prepared by magnetron sputtering
文献类型：期刊论文
| 作者 | Yu, GH ; Zeng, LR ; Zhu, FW ; Chai, CL ; Lai, WY |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2001 |
| 卷号 | 90期号:8页码:4039 |
| 关键词 | SPIN-VALVE MULTILAYERS EXCHANGE-ANISOTROPY THIN-FILMS NIO BIAS INTERFACES MODEL |
| ISSN号 | 0021-8979 |
| 通讯作者 | Yu, GH: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | Ta/NiOx/N81Fe19/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange-coupling field (H-ex) and the coercivity (H-c) of NiOx/Ni81Fe19 as a function of the ratio of Ar to O-2 during the deposition process were studied. The composition and chemical states at the interface region of NiOx/NiFe were also investigated using the x-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that the ratio of Ar to O-2 has a great effect on the nickel chemical states in NiOx film. When the ratio of Ar to O-2 is equal to 7 and the argon sputtering pressure is 0.57 Pa, the x value is approximately 1 and the valence of nickel is +2. At this point, NiOx is antiferromagnetic NiO and the corresponding H-ex is the largest. As the ratio of Ar/O-2 deviates from 7, the exchange-coupling field (H-ex) will decrease due to the presence of magnetic defects such as Ni+3 or metallic Ni at the interface region of NiOx/NiFe, while the coercivity (H-c) will increase due to the metallic Ni. XPS studies also show that there are two thermodynamically favorable reactions at the NiO/NiFe interface: NiO+Fe=Ni+FeO and 3NiO+2Fe=3Ni+Fe2O3. These interface reaction products are magnetic defects at the interface region of NiO/NiFe, it is believed that these magnetic defects would have an effect on the exchange-coupling field (H-ex) and the coercivity (H-c) of NiO/NiFe. (C) 2001 American Institute Of Physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-18 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/41335]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, GH,Zeng, LR,Zhu, FW,et al. Magnetic properties and x-ray photoelectron spectroscopy study of NiO/NiFe films prepared by magnetron sputtering[J]. JOURNAL OF APPLIED PHYSICS,2001,90(8):4039. |
| APA | Yu, GH,Zeng, LR,Zhu, FW,Chai, CL,&Lai, WY.(2001).Magnetic properties and x-ray photoelectron spectroscopy study of NiO/NiFe films prepared by magnetron sputtering.JOURNAL OF APPLIED PHYSICS,90(8),4039. |
| MLA | Yu, GH,et al."Magnetic properties and x-ray photoelectron spectroscopy study of NiO/NiFe films prepared by magnetron sputtering".JOURNAL OF APPLIED PHYSICS 90.8(2001):4039. |
入库方式： OAI收割
来源：物理研究所
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