Microstructure of annealed magnetic tunnel junction by electron microscopy
文献类型：期刊论文
| 作者 | Xu, QY ; Wang, YG ; Zhang, Z ; You, B ; Du, J ; Hu, A |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2003 |
| 卷号 | 93期号:10页码:6229 |
| 关键词 | THERMAL-STABILITY HOLOGRAPHY MAGNETORESISTANCE |
| ISSN号 | 0021-8979 |
| 通讯作者 | Xu, QY: Chinese Acad Sci, Inst Phys, Beijing Lab Electron Microscopy, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | Transmission electron microscopy, high-resolution electron microscopy, and electron holography were used to study the microstructure of CoFe/AlOx/Co magnetic tunnel junctions (MTJs) isochronally annealed up to 400 degreesC. A potential barrier across the metal/oxide interfaces was observed for the as-deposited MTJ sample, and was changed into a well for the MTJ samples annealed at 200 and 400 degreesC, respectively. A shallow potential well was found when the MTJ was annealed at 200 degreesC and the well became deeper as the annealing temperature increased to 400 degreesC. The potential change may attribute to the formation of nonmagnetic metallic Al atoms or clusters when the MTJ sample was annealed at 200 degreesC and the rest content of the barrier layer was more close to Al2O3, which results in the enhancement of tunneling magnetoresistance (TMR). When the MTJ sample was annealed at 400 degreesC, more Co and Fe atoms or clusters might diffuse from the ferromagnetic layers into the barrier layer, resulting in the deeper well, and thus significantly decrease the TMR value due to the severe spin-flip scattering. (C) 2003 American Institute of Physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-18 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/42110]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Xu, QY,Wang, YG,Zhang, Z,et al. Microstructure of annealed magnetic tunnel junction by electron microscopy[J]. JOURNAL OF APPLIED PHYSICS,2003,93(10):6229. |
| APA | Xu, QY,Wang, YG,Zhang, Z,You, B,Du, J,&Hu, A.(2003).Microstructure of annealed magnetic tunnel junction by electron microscopy.JOURNAL OF APPLIED PHYSICS,93(10),6229. |
| MLA | Xu, QY,et al."Microstructure of annealed magnetic tunnel junction by electron microscopy".JOURNAL OF APPLIED PHYSICS 93.10(2003):6229. |
入库方式： OAI收割
来源：物理研究所
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