中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The growth and characterization of GaN grown on an Al2O3 coated (001)Si substrate by metalorganic vapor phase epitaxy

文献类型:期刊论文

作者Wang, LS ; Liu, XL ; Zan, YD ; Wang, D ; Lu, DC ; Wang, ZG ; Wang, YT ; Cheng, LS ; Zhang, Z
刊名JOURNAL OF CRYSTAL GROWTH
出版日期1998
卷号193期号:4页码:484
关键词MOLECULAR-BEAM EPITAXY SINGLE CRYSTALLINE GAN HIGH-QUALITY GAN INTERMEDIATE LAYER BUFFER LAYERS SI FILMS ALN DEPOSITION SAPPHIRE
ISSN号0022-0248
通讯作者Wang, LS (reprint author), Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China.
中文摘要Single crystal GaN films have been grown on to an Al2O3 coated (001)Si substrate in a horizontal-type low-pressure MOVPE system. A thin Al2O3 layer is an intermediate layer for the growth of single crystal GaN on to Si although it is only an oriented polycrystal him as shown by reflection high electron diffraction. Moreover, the oxide was not yet converted to a fully single crystal film, even at the stage of high temperature for the GaN overlayer as studied by transmission electron microscopy. Double crystal X-ray diffraction showed that the linewidth of (0002) peak of the X-ray rocking curve of the 1.3 mu m sample was 54 arcmin and the films had heavy mosaic structures. A near band edge peaking at 3.4 eV at room temperature was observed by photoluminescence spectroscopy. (C) 1998 Elsevier Science B.V. All rights reserved.
收录类别SCI
语种英语
公开日期2013-09-23
源URL[http://ir.iphy.ac.cn/handle/311004/45183]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Wang, LS,Liu, XL,Zan, YD,et al. The growth and characterization of GaN grown on an Al2O3 coated (001)Si substrate by metalorganic vapor phase epitaxy[J]. JOURNAL OF CRYSTAL GROWTH,1998,193(4):484.
APA Wang, LS.,Liu, XL.,Zan, YD.,Wang, D.,Lu, DC.,...&Zhang, Z.(1998).The growth and characterization of GaN grown on an Al2O3 coated (001)Si substrate by metalorganic vapor phase epitaxy.JOURNAL OF CRYSTAL GROWTH,193(4),484.
MLA Wang, LS,et al."The growth and characterization of GaN grown on an Al2O3 coated (001)Si substrate by metalorganic vapor phase epitaxy".JOURNAL OF CRYSTAL GROWTH 193.4(1998):484.

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来源:物理研究所

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