中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The incorporation behavior of arsenic and antimony in GaAsSb/GaAs grown by solid source molecular beam epitaxy

文献类型:期刊论文

作者Wu, SD ; Guo, LW ; Wang, WX ; Li, ZH ; Shang, XZ ; Hu, HY ; Huang, Q ; Zhou, JM
刊名JOURNAL OF CRYSTAL GROWTH
出版日期2004
卷号270期号:3-4页码:359
关键词GROUP-V ELEMENTS III-V THERMODYNAMIC ANALYSIS GAAS SEMICONDUCTORS KINETICS INGAASP AS-2
ISSN号0022-0248
通讯作者Wu, SD (reprint author), Chinese Acad Sci, Inst Phys, Grp SF02, POB 603, Beijing 100080, Peoples R China.
中文摘要GaAsSb ternary epitaxial layers were grown on GaAs (001) substrate in various Sb-4/As-2 flux ratios by solid source molecular beam epitaxy. The alloy compositions of GaAs1-ySby were inferred using high-resolution X-ray symmetric (004) and asymmetric (224) glance exit diffraction. The non-equilibrium thermodynamic model is used to explain the different incorporation behavior between the Sb-4 and As-2 under the assumption that one incident Sb-4 molecule produces one active Sb-2 molecule. It is inferred that the activation energy of Sb-4 dissociation is about 0.46 eV. The calculated results for the incorporation efficiency of group V are in good agreement with the experimental data. (C) 2004 Elsevier B.V. All rights reserved.
收录类别SCI
语种英语
公开日期2013-09-23
源URL[http://ir.iphy.ac.cn/handle/311004/45218]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Wu, SD,Guo, LW,Wang, WX,et al. The incorporation behavior of arsenic and antimony in GaAsSb/GaAs grown by solid source molecular beam epitaxy[J]. JOURNAL OF CRYSTAL GROWTH,2004,270(3-4):359.
APA Wu, SD.,Guo, LW.,Wang, WX.,Li, ZH.,Shang, XZ.,...&Zhou, JM.(2004).The incorporation behavior of arsenic and antimony in GaAsSb/GaAs grown by solid source molecular beam epitaxy.JOURNAL OF CRYSTAL GROWTH,270(3-4),359.
MLA Wu, SD,et al."The incorporation behavior of arsenic and antimony in GaAsSb/GaAs grown by solid source molecular beam epitaxy".JOURNAL OF CRYSTAL GROWTH 270.3-4(2004):359.

入库方式: OAI收割

来源:物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。